Study on plastic deformation removal mechanism and dislocation change in nano‐grinding of single crystal silicon carbide with random rough surface

Dongling Yu, Haican Shen, Jinyu Chen, Jiao Li, Jianbo Le, Nanxing Wu
{"title":"Study on plastic deformation removal mechanism and dislocation change in nano‐grinding of single crystal silicon carbide with random rough surface","authors":"Dongling Yu, Haican Shen, Jinyu Chen, Jiao Li, Jianbo Le, Nanxing Wu","doi":"10.1002/pssa.202300726","DOIUrl":null,"url":null,"abstract":"This investigation centers on exploring the plastic deformation removal mechanism and dislocation dynamics in the nano‐grinding of single crystal silicon carbide featuring a randomly rough surface. To simulate this, a novel approach combining the Weierstrass‐Mandelbrot fractal surface function with molecular dynamics is employed. Generate randomly rough surface contours using the Weierstrass‐Mandelbrot fractal surface function. By adjusting the fractal dimension, an ideal representation of single crystal silicon carbide with randomly rough surfaces is obtained. By combining plastic deformation detection methods, the process of workpiece sliding, plowing, and chip removal is thoroughly studied, and the plastic deformation removal mechanism of random rough surface grinding is explored; Combining post‐processing methods such as sheer strain and dislocation trajectory, analyze the morphological changes and transformation mechanisms of dislocations. Notably, at a grinding depth of 33.18nm, the activation of slip systems induces dislocation formation, enabling plastic deformation. Furthermore, at depths exceeding 144.00nm, the emergence of stacking faults on the random rough surface is observed. Throughout the grinding procedure, plastic deformation of debris occurs, leading to the formation of plastic bulges on both sides of the tool, the debris generated during processing does not significantly impact the defects encountered during secondary grinding of the rough surface.This article is protected by copyright. All rights reserved.","PeriodicalId":20150,"journal":{"name":"physica status solidi (a)","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2023-12-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"physica status solidi (a)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1002/pssa.202300726","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

This investigation centers on exploring the plastic deformation removal mechanism and dislocation dynamics in the nano‐grinding of single crystal silicon carbide featuring a randomly rough surface. To simulate this, a novel approach combining the Weierstrass‐Mandelbrot fractal surface function with molecular dynamics is employed. Generate randomly rough surface contours using the Weierstrass‐Mandelbrot fractal surface function. By adjusting the fractal dimension, an ideal representation of single crystal silicon carbide with randomly rough surfaces is obtained. By combining plastic deformation detection methods, the process of workpiece sliding, plowing, and chip removal is thoroughly studied, and the plastic deformation removal mechanism of random rough surface grinding is explored; Combining post‐processing methods such as sheer strain and dislocation trajectory, analyze the morphological changes and transformation mechanisms of dislocations. Notably, at a grinding depth of 33.18nm, the activation of slip systems induces dislocation formation, enabling plastic deformation. Furthermore, at depths exceeding 144.00nm, the emergence of stacking faults on the random rough surface is observed. Throughout the grinding procedure, plastic deformation of debris occurs, leading to the formation of plastic bulges on both sides of the tool, the debris generated during processing does not significantly impact the defects encountered during secondary grinding of the rough surface.This article is protected by copyright. All rights reserved.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
随机粗糙表面单晶碳化硅纳米研磨中塑性变形去除机理及位错变化研究
这项研究的核心是探索具有随机粗糙表面的单晶碳化硅纳米研磨过程中的塑性变形消除机制和位错动力学。为了模拟这一过程,我们采用了一种将魏尔斯特拉斯-曼德尔布罗特分形表面函数与分子动力学相结合的新方法。利用魏尔斯特拉斯-曼德尔布罗分形表面函数生成随机粗糙表面轮廓。通过调整分形维度,获得了具有随机粗糙表面的单晶碳化硅的理想表示。结合塑性变形检测方法,深入研究了工件滑动、犁耕和排屑过程,探索了随机粗糙表面磨削的塑性变形去除机理;结合峭度应变和位错轨迹等后处理方法,分析了位错的形态变化和转变机理。值得注意的是,在磨削深度为 33.18nm 时,滑移系统的激活诱发了位错的形成,从而实现了塑性变形。此外,在深度超过 144.00nm 时,随机粗糙表面上出现了堆积断层。在整个磨削过程中,碎屑发生塑性变形,导致在工具两侧形成塑性隆起,加工过程中产生的碎屑不会对粗糙表面二次磨削过程中遇到的缺陷产生重大影响。本文受版权保护,保留所有权利。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Ultrafast Laser Hyperdoped Black Silicon and Its Application in Photodetectors: A Review Dynamic RON Degradation Suppression by Gate Field Plate in Partially Recessed AlGaN/GaN Metal–Insulator–Semiconductor High‐Electron‐Mobility Transistors Graphene Oxide as Novel Visible Light Active Photocatalyst: Synthesis, Modification by Nitrogen and Boron Doping, and Photocatalytic Application Influence of Parameters in Vapor Transport Equilibration Treatment on Composition and Homogeneity of LiTaO3 Single Crystals Comparative Study on Temperature‐Dependent Internal Quantum Efficiency and Light–Extraction Efficiency in III‐Nitride–, III‐Phosphide–, and III‐Arsenide–based Light‐Emitting Diodes
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1