GENERATION OF COMPENSATED ION-ELECTRON FLOW IN THE COMBINED MAGNETRON-ION-PLASMA SYSTEM

IF 0.5 Q4 PHYSICS, NUCLEAR Problems of Atomic Science and Technology Pub Date : 2023-12-12 DOI:10.46813/2023-148-090
A. Zykov, N. Yefymenko, S. Dudin, S. Yakovin, N. Azarenkov
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引用次数: 0

Abstract

The design and characteristics of the combined Magnetron-Ion-Plasma System (MIPS) are presented. The system includes a magnetron sputtering system and a Hall-type ion source with a common magnetic system and common power supply allowing the generation of quasi-neutral ion-electron flow, which provides complete charge neutralization on the processed dielectric surface. The formation of the anode electron layer and the energy spectra of ions are experimentally investigated. A phenomenological model of the combined discharge in EН fields is proposed. Theoretical calculations and experimental data are in reasonable agreement.
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在磁控-离子-等离子体组合系统中产生补偿离子-电子流
介绍了磁控管-离子-等离子体组合系统(MIPS)的设计和特点。该系统包括一个磁控溅射系统和一个霍尔型离子源,具有共用磁系统和共用电源,可产生准中性离子-电子流,从而在处理过的电介质表面提供完全的电荷中和。实验研究了阳极电子层的形成和离子的能谱。提出了在 EН 场中的组合放电现象学模型。理论计算和实验数据非常吻合。
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来源期刊
CiteScore
0.70
自引率
50.00%
发文量
0
审稿时长
2-4 weeks
期刊介绍: The journal covers the following topics: Physics of Radiation Effects and Radiation Materials Science; Nuclear Physics Investigations; Plasma Physics; Vacuum, Pure Materials and Superconductors; Plasma Electronics and New Methods of Acceleration.
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