GENERATION OF COMPENSATED ION-ELECTRON FLOW IN THE COMBINED MAGNETRON-ION-PLASMA SYSTEM

IF 0.5 Q4 PHYSICS, NUCLEAR Problems of Atomic Science and Technology Pub Date : 2023-12-12 DOI:10.46813/2023-148-090
A. Zykov, N. Yefymenko, S. Dudin, S. Yakovin, N. Azarenkov
{"title":"GENERATION OF COMPENSATED ION-ELECTRON FLOW IN THE COMBINED MAGNETRON-ION-PLASMA SYSTEM","authors":"A. Zykov, N. Yefymenko, S. Dudin, S. Yakovin, N. Azarenkov","doi":"10.46813/2023-148-090","DOIUrl":null,"url":null,"abstract":"The design and characteristics of the combined Magnetron-Ion-Plasma System (MIPS) are presented. The system includes a magnetron sputtering system and a Hall-type ion source with a common magnetic system and common power supply allowing the generation of quasi-neutral ion-electron flow, which provides complete charge neutralization on the processed dielectric surface. The formation of the anode electron layer and the energy spectra of ions are experimentally investigated. A phenomenological model of the combined discharge in EН fields is proposed. Theoretical calculations and experimental data are in reasonable agreement.","PeriodicalId":54580,"journal":{"name":"Problems of Atomic Science and Technology","volume":"38 4","pages":""},"PeriodicalIF":0.5000,"publicationDate":"2023-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Problems of Atomic Science and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.46813/2023-148-090","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"PHYSICS, NUCLEAR","Score":null,"Total":0}
引用次数: 0

Abstract

The design and characteristics of the combined Magnetron-Ion-Plasma System (MIPS) are presented. The system includes a magnetron sputtering system and a Hall-type ion source with a common magnetic system and common power supply allowing the generation of quasi-neutral ion-electron flow, which provides complete charge neutralization on the processed dielectric surface. The formation of the anode electron layer and the energy spectra of ions are experimentally investigated. A phenomenological model of the combined discharge in EН fields is proposed. Theoretical calculations and experimental data are in reasonable agreement.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
在磁控-离子-等离子体组合系统中产生补偿离子-电子流
介绍了磁控管-离子-等离子体组合系统(MIPS)的设计和特点。该系统包括一个磁控溅射系统和一个霍尔型离子源,具有共用磁系统和共用电源,可产生准中性离子-电子流,从而在处理过的电介质表面提供完全的电荷中和。实验研究了阳极电子层的形成和离子的能谱。提出了在 EН 场中的组合放电现象学模型。理论计算和实验数据非常吻合。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
CiteScore
0.70
自引率
50.00%
发文量
0
审稿时长
2-4 weeks
期刊介绍: The journal covers the following topics: Physics of Radiation Effects and Radiation Materials Science; Nuclear Physics Investigations; Plasma Physics; Vacuum, Pure Materials and Superconductors; Plasma Electronics and New Methods of Acceleration.
期刊最新文献
THE BURN-UP PROFILE OF THE COMPTON NEUTRON DETECTOR Hf-EMITTER IN THE WWER-1000 REACTOR SLOW ELECTROMAGNETIC WAVES IN PLANAR THREE-COMPONENT WAVEGUIDE STRUCTURE WITH MU-NEGATIVE METAMATERIAL TAGGING EFFICIENCY ESTIMATION IN EXPERIMENTS WITH A COHERENT BREMSSTRAHLUNG BEAM FEATURES OF STRUCTURAL DAMAGES OF SURFACE OF TUNGSTEN AS A RESULT OF IRRADIATION WITH HELIUM ION BEAMS WITH ENERGY 4 MeV SIMULATION OF DEFLECTING SYSTEM BASED ON PERMANENT MAGNETS WITH A NON-UNIFORM MAGNETIC FIELD TO REGISTER ACCELERATED AND DECELERATED ELECTRONS GENERATED IN DIELECTRIC LASER ACCELERATOR
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1