A DFT study of the optoelectronic properties of B and Be-doped Graphene

L. O. Agbolade, A. K. Y. Dafhalla, D. M. I. Zayan, T. Adam, A. Chik, A. A. Adewale, S. C. B. Gopinath, U. Hashim
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Abstract

The electronic and optical properties of Boron (B) and Beryllium (Be)-doped graphene were determined using the ab initio approach based on the generalized gradient approximations within the Full potential linearized Augmented Plane wave formalism (FP-LAPW) formalism. Our findings demonstrated that doping at the edges of graphene is notably stable. In both systems, Be-doped graphene proves more efficient in manipulating the band gap of graphene. Both B and Be induce P-type doping in graphene. B-doped graphene exhibits a negligible magnetic moment of 0.000742, suggesting its suitability for catalytic semiconductor devices. Conversely, Be-doped graphene displays a large magnetic moment of 1.045 µB indicating its potential in spintronics. Additionally, this study elucidates the influence of the dielectric matrices on the optical properties of graphene. These findings underscore a stable and controllable method for modelling graphene at its edges with B and Be atoms, opening new avenues for designing of these devices.
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关于 B 和掺杂 B 的石墨烯光电特性的 DFT 研究
我们采用基于全电势线性化增强平面波形式主义(FP-LAPW)中广义梯度近似的 ab initio 方法,测定了掺杂硼(B)和掺杂铍(Be)的石墨烯的电子和光学特性。我们的研究结果表明,石墨烯边缘的掺杂具有显著的稳定性。在这两个系统中,掺杂铍的石墨烯在操纵石墨烯带隙方面更有效。硼和铍都能诱导石墨烯中的 P 型掺杂。掺杂 B 的石墨烯的磁矩为 0.000742,可以忽略不计,这表明它适用于催化半导体器件。相反,掺杂铍的石墨烯显示出 1.045 µB 的大磁矩,表明其具有自旋电子学的潜力。此外,这项研究还阐明了介电基质对石墨烯光学特性的影响。这些发现强调了在石墨烯边缘用 B 原子和 Be 原子建模的稳定可控方法,为设计这些器件开辟了新途径。
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