Adsorption of Hydrogen Molecules in Nickel Decorated Silicene

Prajwal Shrestha, Nurapathi Panth
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Abstract

First-principles simulations based on density functional theory (DFT) have been used to study the structural, electronic and magnetic properties of pristine and Ni decorated silicene sheets. Generalized Gradient Approximation (GGA) based exchange correlation functionals are used under software package Quantum ESPRESSO (QE), 6.5 versions. We have reconstructed the optimized unit cell of silicene, which has a face centered cubic (fcc) structure with two silicon atoms having lattice parameters a = b = 3.8 Å. The distance between two nearest silicene monolayers is found to be 20.5 Å which is large enough to neglect the interlayer interactions between 4×4 supercells of silicene monolayers. The atoms in the prepared supercell are fully relaxed under Bloyden-Fletcher-Goldfarb-Shanno (BFGS) scheme prior to the self-consistent, band structure and density of state (DoS) calculations. The pristine silicene is semi-metallic in nature possessing a Dirac-cone as in graphene. The h-site adsorption is found to be the most stable adsorption site of nickel in silicene with the binding energy of 4.69 eV. The addition of nickel atom completely distorts the hexagonal structure of silicene destroying the Dirac cone and the system becomes slightly insulating from its semi-metallic nature. We then construct a 4×4 nickel dimer silicene which further destroys the hexagonal silicene structure with further opening of the band gap. The charge transfer analysis in the Ni decorated systems shows the charge transfers of 0.163e and 0.294e in Ni adatom silicene and Ni dimer silicene respectively showing that the nickel atoms are adsorbed by weak van der Waals forces in both of the systems. We then proceed to hydrogen molecule adsorption in these prepared 4×4 silicene systems: pristine, Ni adatom and Ni dimer silicene systems. The adsorption energy of hydrogen in the Ni adatom silicene is found to be the largest making it the most effective system for hydrogen storage.
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镍装饰硅烯对氢分子的吸附
基于密度泛函理论(DFT)的第一原理模拟被用来研究原始硅片和镍装饰硅片的结构、电子和磁性能。在量子 ESPRESSO(QE)6.5 版软件包中使用了基于广义梯度逼近(GGA)的交换相关函数。我们重建了硅烯的优化单胞,它具有面心立方(ccc)结构,两个硅原子的晶格参数为 a = b = 3.8 Å。在进行自洽、能带结构和状态密度(DoS)计算之前,根据 Bloyden-Fletcher-Goldfarb-Shanno(BFGS)方案对制备的超胞中的原子进行了充分松弛。原始硅烯具有半金属性质,与石墨烯一样具有狄拉克锥。研究发现,h-位吸附是镍在硅烯中最稳定的吸附位,其结合能为 4.69 eV。镍原子的加入完全扭曲了硅烯的六边形结构,破坏了狄拉克锥,系统从半金属性质变得轻微绝缘。然后,我们构建了一个 4×4 镍二聚体硅烯,它进一步破坏了硅烯的六边形结构,并进一步打开了带隙。镍装饰体系中的电荷转移分析表明,镍腺体硅烯和镍二聚体硅烯中的电荷转移分别为 0.163e 和 0.294e,这表明在这两个体系中,镍原子是通过微弱的范德华力吸附的。然后,我们继续研究氢分子在这些制备的 4×4 硅烯体系(原始体系、镍腺体体系和镍二聚体硅烯体系)中的吸附情况。我们发现氢在 Ni adatom 硅烯体系中的吸附能最大,使其成为最有效的储氢体系。
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