Plasma-Deposited CoO–(Carbon Matrix) Thin-Film Nanocatalysts: The Impact of Nanoscale p-n Heterojunctions on Activity in CO2 Methanation

Abstract

Addressing the challenges associated with the highly exothermic nature of CO2 methanation, there is considerable interest in innovative catalyst designs on structural metallic supports. One promising solution in this regard involves thin films containing cobalt oxide within a carbon matrix, fabricated using the cold plasma deposition method (PECVD). The objective of this study was to search for a relationship between the molecular structure, nanostructure, and electronic structure of such films and their catalytic activity. The investigations employed various techniques, including X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS), X-ray diffraction (XRD), UV-VIS absorption, and catalytic tests in the CO2 methanation process. Three types of films were tested: untreated as-deposited (ad-CoO), thermally post-treated (TT-CoO), and argon plasma post-treated (PT-CoO) films. Among these, TT-CoO exhibited the most favorable catalytic properties, demonstrating a CO2 conversion rate of 83%, CH4 selectivity of 98% at 400 °C, and stability during the catalytic process. This superior performance was attributed to the formation of nanoscale heterojunctions in the TT-CoO film, where p-type CoO nanocrystallites interacted with the n-type carbon matrix. This work provides compelling evidence highlighting the key role of nanoscale heterojunctions in shaping the properties of nanocatalysts in thermal catalysis. These findings suggest promising prospects for designing new catalytic systems by manipulating interactions at the nanoscale.