Formation of ZnWO4/WO3 composite film by RF magnetron sputtering and calcination

Sho Kakuta, Takeru Okada
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Abstract

This study demonstrates the formation of ZnWO4/WO3 composite that are engendered by cosputtering deposition followed by calcination. The concentrations of the tungsten dopant are found to have a profound effect on crystal formation, composition, and photoluminescence. The quantum efficiency measurements investigating different excitation light directions indicate that WO3 can form an underlayer of ZnWO4 at high dopant concentrations. The formation of bilayerlike films is caused by segregation, resulting from time evolution of sputtering yield due to temperature changes at the surface of the sputtering target.
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通过射频磁控溅射和煅烧形成 ZnWO4/WO3 复合薄膜
本研究展示了通过共溅沉积和煅烧形成的 ZnWO4/WO3 复合材料。研究发现,掺杂钨的浓度对晶体的形成、组成和光致发光有深远影响。对不同激发光方向的量子效率测量表明,在高掺杂浓度下,WO3 可以形成 ZnWO4 的底层。双层膜的形成是由偏析引起的,而偏析是由于溅射靶表面温度变化引起的溅射产率的时间演化造成的。
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