Preparation and tribological properties of Ni/DLC multilayer film

Yanxia Wu, Jiawei Qi, Ke Li, Xiaoyan Zhou, Shengwang Yu, Caili Zhang, Ying Liu
{"title":"Preparation and tribological properties of Ni/DLC multilayer film","authors":"Yanxia Wu, Jiawei Qi, Ke Li, Xiaoyan Zhou, Shengwang Yu, Caili Zhang, Ying Liu","doi":"10.1116/6.0003431","DOIUrl":null,"url":null,"abstract":"Ni was selected as a transition layer and sublayer in the diamondlike carbon-based multilayered film with varied bilayer periods (from 228 to 970 nm) prepared by magnetron sputtering. The reaction between Ni- and C-containing particles was discussed, and the influences of bilayer periods on the structure and morphology, accompanied with the frictional behaviors at different loading forces (2 and 5 N), as well as the field emission properties were investigated. The results showed that Ni grew in the (111) plane, and there was no Ni–C bond or graphene formed in the film because of the relatively lower energy during deposition. Moreover, the content of sp2C in the film, the hardness, and the field emission performance exhibited an initial increase followed by a subsequent decrease with increasing bilayer periods. However, the frictional coefficient decreased owing to more graphitization with an increase of the applied load. Particularly noteworthy was that the film possessed a bilayer period of 710 nm, displayed a compact structure with a smaller grain size, and showed reduced sp2C content in the role of Ni. This resulted in sustained lower surface roughness, heightened hardness, decreased coefficient of friction, and a smaller opening electric field.","PeriodicalId":509398,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"30 12","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-02-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Vacuum Science & Technology A","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1116/6.0003431","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

Ni was selected as a transition layer and sublayer in the diamondlike carbon-based multilayered film with varied bilayer periods (from 228 to 970 nm) prepared by magnetron sputtering. The reaction between Ni- and C-containing particles was discussed, and the influences of bilayer periods on the structure and morphology, accompanied with the frictional behaviors at different loading forces (2 and 5 N), as well as the field emission properties were investigated. The results showed that Ni grew in the (111) plane, and there was no Ni–C bond or graphene formed in the film because of the relatively lower energy during deposition. Moreover, the content of sp2C in the film, the hardness, and the field emission performance exhibited an initial increase followed by a subsequent decrease with increasing bilayer periods. However, the frictional coefficient decreased owing to more graphitization with an increase of the applied load. Particularly noteworthy was that the film possessed a bilayer period of 710 nm, displayed a compact structure with a smaller grain size, and showed reduced sp2C content in the role of Ni. This resulted in sustained lower surface roughness, heightened hardness, decreased coefficient of friction, and a smaller opening electric field.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
镍/DLC 多层薄膜的制备和摩擦学特性
在磁控溅射法制备的具有不同双层周期(从 228 纳米到 970 纳米)的类金刚石碳基多层膜中,镍被选为过渡层和亚层。讨论了含镍和含碳粒子之间的反应,研究了双层周期对结构和形貌的影响,以及在不同加载力(2 和 5 N)下的摩擦行为和场发射特性。结果表明,镍生长在(111)面上,由于沉积时的能量相对较低,薄膜中没有形成镍-碳键或石墨烯。此外,薄膜中的 sp2C 含量、硬度和场发射性能随着双层周期的增加呈现先增加后降低的趋势。然而,随着施加载荷的增加,由于石墨化程度加深,摩擦系数也随之降低。特别值得注意的是,薄膜的双层周期为 710 nm,结构紧凑,晶粒尺寸较小,并且在镍的作用下,sp2C 含量降低。这使得表面粗糙度持续降低,硬度提高,摩擦系数降低,开口电场变小。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Impact of sputtering and redeposition on the morphological profile evolution during ion-beam etching of blazed gratings Nitrogen-incorporated tetrahedral amorphous carbon optically transparent thin film electrode Effect of plasma discharge pulse length for GaN film crystallinity on sapphire substrate by high density convergent plasma sputtering device Inhibition of thermochemical erosion by different coatings attached to the barrel chamber at high temperature and supersonic environments Influence of high-temperature thermal annealing on paramagnetic point defects in silicon-rich silicon nitride films formed in a single-wafer-type low-pressure chemical vapor deposition reactor
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1