Yuma Sugai, Hironori Sugata, Takuya Sugawara, Safdar Muhammad, Jani Hämäläinen, Nina Lamminmäki, Juhana Kostamo
{"title":"Optical, chemical and coverage properties of magnesium fluoride formed by atomic layer deposition","authors":"Yuma Sugai, Hironori Sugata, Takuya Sugawara, Safdar Muhammad, Jani Hämäläinen, Nina Lamminmäki, Juhana Kostamo","doi":"10.1007/s10043-024-00867-7","DOIUrl":null,"url":null,"abstract":"<p>Magnesium fluoride (MgF<sub>2</sub>) thin films deposited using atomic layer deposition (ALD) were studied for use as optical coatings, meta-surface anti-reflection layer, and chemically resistive passivation. The deposition was performed in a commercially available Picosun® R-200 Advanced ALD reactor. Characterization of composition, density, optical property, chemical resistivity and coverage were performed. ALD-deposited films showed high R + T at wavelength down to 350 nm, excellent 3D coverage, and high chemical resistivity. This technology enables unique properties to improve 3D structured optics such as metasurface.</p>","PeriodicalId":722,"journal":{"name":"Optical Review","volume":"17 1","pages":""},"PeriodicalIF":1.1000,"publicationDate":"2024-03-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Review","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1007/s10043-024-00867-7","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"OPTICS","Score":null,"Total":0}
引用次数: 0
Abstract
Magnesium fluoride (MgF2) thin films deposited using atomic layer deposition (ALD) were studied for use as optical coatings, meta-surface anti-reflection layer, and chemically resistive passivation. The deposition was performed in a commercially available Picosun® R-200 Advanced ALD reactor. Characterization of composition, density, optical property, chemical resistivity and coverage were performed. ALD-deposited films showed high R + T at wavelength down to 350 nm, excellent 3D coverage, and high chemical resistivity. This technology enables unique properties to improve 3D structured optics such as metasurface.
期刊介绍：
Optical Review is an international journal published by the Optical Society of Japan. The scope of the journal is:
General and physical optics;
Quantum optics and spectroscopy;
Information optics;
Photonics and optoelectronics;
Biomedical photonics and biological optics;
Lasers;
Nonlinear optics;
Optical systems and technologies;
Optical materials and manufacturing technologies;
Vision;
Infrared and short wavelength optics;
Cross-disciplinary areas such as environmental, energy, food, agriculture and space technologies;
Other optical methods and applications.
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