Preparation of Ag-Cu nanoparticle film using a dual-beam pulsed laser deposition for power electronic packaging

IF 1.7 4区 工程技术 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Journal of Laser Applications Pub Date : 2024-03-25 DOI:10.2351/7.0001321
Bolong Zhou, Qiang Jia, Yishu Wang, Dan Li, Hongqiang Zhang, Huan Hu, Limin Ma, Guisheng Zou, Fu Guo
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Abstract

Ag-Cu nanoparticles, integrating the advantages of Ag and Cu, are promising materials for power electronic packaging. In this work, a novel dual-beam pulsed laser deposition method was proposed to prepare an Ag-Cu nanoparticle film with various component ratios and used for die attach at low temperatures. The as-deposited Ag-Cu nanoparticle film was mainly composed of Ag-Cu solid solution, Ag element, and Cu element, and most of the nanoparticles were in the alloying state. The Ag-Cu sintered joint presented a dense microstructure with 10.8% porosity, and the shear strength of Ag-Cu sintered joints could reach 60 MPa at 250 °C. The sintered joint porosity increased as more Cu were added in the Ag-Cu nanoparticle film, resulting in a decrease in the interfacial connection ratio. The fracture mode of sintered joints gradually changed from the sintered layer to the mixed sintered layer and interface fracture. The dual-beam pulsed laser deposition method could guide in designing the component ratios of bimetallic nanoparticles.
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利用双束脉冲激光沉积法制备用于电力电子封装的银铜纳米粒子薄膜
银铜纳米粒子集成了银和铜的优点,是一种很有前途的电力电子封装材料。本研究提出了一种新颖的双束脉冲激光沉积方法,制备了不同成分比例的银铜纳米粒子薄膜,并将其用于低温下的芯片贴装。沉积后的银铜纳米粒子膜主要由银铜固溶体、银元素和铜元素组成,大部分纳米粒子处于合金状态。Ag-Cu烧结接头呈现出致密的微观结构,孔隙率为10.8%,250 ℃时Ag-Cu烧结接头的剪切强度可达60 MPa。随着银铜纳米颗粒薄膜中铜含量的增加,烧结接头的孔隙率也随之增加,导致界面连接比下降。烧结接头的断裂模式从烧结层逐渐转变为混合烧结层和界面断裂。双束脉冲激光沉积法可指导设计双金属纳米粒子的组分比例。
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来源期刊
CiteScore
3.60
自引率
9.50%
发文量
125
审稿时长
>12 weeks
期刊介绍: The Journal of Laser Applications (JLA) is the scientific platform of the Laser Institute of America (LIA) and is published in cooperation with AIP Publishing. The high-quality articles cover a broad range from fundamental and applied research and development to industrial applications. Therefore, JLA is a reflection of the state-of-R&D in photonic production, sensing and measurement as well as Laser safety. The following international and well known first-class scientists serve as allocated Editors in 9 new categories: High Precision Materials Processing with Ultrafast Lasers Laser Additive Manufacturing High Power Materials Processing with High Brightness Lasers Emerging Applications of Laser Technologies in High-performance/Multi-function Materials and Structures Surface Modification Lasers in Nanomanufacturing / Nanophotonics & Thin Film Technology Spectroscopy / Imaging / Diagnostics / Measurements Laser Systems and Markets Medical Applications & Safety Thermal Transportation Nanomaterials and Nanoprocessing Laser applications in Microelectronics.
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