Aadit Sharma, T. Hutchins-Delgado, S. Nazib, Erum Jamil, John N. Nogan, Anthony R. James, Marek Osiński
{"title":"Bimetallic-catalyst metal-assisted chemical etching for tailored formation of high-aspect-ratio III−V compound semiconductor submicron pillar arrays","authors":"Aadit Sharma, T. Hutchins-Delgado, S. Nazib, Erum Jamil, John N. Nogan, Anthony R. James, Marek Osiński","doi":"10.1117/12.3007334","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":517975,"journal":{"name":"Physics and Simulation of Optoelectronic Devices XXXII","volume":"25 6","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-03-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Physics and Simulation of Optoelectronic Devices XXXII","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.3007334","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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