Novel high-efficiency plasma nitriding process utilizing a high power impulse magnetron sputtering discharge

A. Ehiasarian, P. Hovsepian
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Abstract

Lifetime and biocompatibility of orthopedic implants are crucial in meeting the new challenges brought about by the fall in the patient age and the aging population. The high-load surfaces in contact with the biological environment must display enhanced tribological properties, biocompatibility, and reduced metal ion release in long-term clinical performance. Surface modification techniques such as nitriding can significantly improve the in-service behavior of the medical-grade alloys in current use. We report on a novel approach for nitriding of CoCrMo alloys using high power impulse magnetron sputtering (HIPIMS) discharge. The new nitriding process has been successfully carried out at the National HIPIMS Technology Centre at Sheffield Hallam University, UK, in an industrial size Hauzer 1000-4 system enabled with HIPIMS technology. While the nitriding ion flux is controlled by the HIPIMS magnetron plasma source, the ion energy can be independently set via the substrate bias. Implementing the HIPIMS source allows reducing the operational pressure by one order of magnitude compared to conventional dc plasma nitriding (DCPN). Plasma analyses have identified significantly enhanced production of ions of molecular nitrogen (N2+), atomic nitrogen (N+), and N2H+ radicals in the HIPIMS discharge compared to DCPN. Because of the low pressure of operation of the HIPIMS process, the energy of ions is similar to the bias voltage, whereas the high pressures used in DCPN cause severe losses in ion energy due to scattering collisions within the sheath. The high flux and high ion energy are primarily responsible for achieving a fourfold increase in process productivity as compared to state-of-the-art plasma nitriding processes. The nitrided surface layers exhibit excellent mechanical and tribological properties, which bring about significant improvements in hardness, fracture toughness, and wear. The protective function of the nitrided layer against corrosion in the aggressive environments of simulated body fluid is remarkably augmented. The barrier properties of the nitrided layer have been demonstrated through a reduction in metal ion release by as much as a factor of 2, 4, and 10 for Co, Cr, and Mo, respectively.
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利用高功率脉冲磁控溅射放电的新型高效等离子氮化工艺
要应对患者年龄下降和人口老龄化带来的新挑战,骨科植入物的使用寿命和生物相容性至关重要。与生物环境接触的高负荷表面必须具有更强的摩擦学特性、生物相容性,并在长期临床使用中减少金属离子的释放。氮化等表面改性技术可显著改善目前使用的医用级合金的使用性能。我们报告了一种利用高功率脉冲磁控溅射(HIPIMS)放电对 CoCrMo 合金进行氮化处理的新方法。英国谢菲尔德哈勒姆大学的国家 HIPIMS 技术中心在采用 HIPIMS 技术的工业规模 Hauzer 1000-4 系统中成功实施了新的氮化工艺。氮化离子流量由 HIPIMS 磁控管等离子源控制,而离子能量则可通过基片偏压独立设置。与传统的直流等离子氮化(DCPN)相比,采用 HIPIMS 源可将工作压力降低一个数量级。等离子体分析表明,与 DCPN 相比,HIPIMS 放电中分子氮 (N2+)、原子氮 (N+) 和 N2H+ 自由基离子的产生量明显增加。由于 HIPIMS 过程的工作压力较低,离子的能量与偏置电压相近,而 DCPN 中使用的高压则会因护套内的散射碰撞而导致离子能量的严重损失。与最先进的等离子氮化工艺相比,高通量和高离子能量是工艺生产率提高四倍的主要原因。氮化表面层具有优异的机械和摩擦学特性,在硬度、断裂韧性和磨损方面都有显著改善。氮化层在模拟体液侵蚀环境中的抗腐蚀保护功能显著增强。氮化层的阻隔特性通过金属离子释放量的减少得到了证明,钴、铬和钼的释放量分别减少了 2 倍、4 倍和 10 倍。
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