Pixelated non-volatile programmable photonic integrated circuits with 20-level intermediate states

IF 16.1 1区 工程技术 Q1 ENGINEERING, MANUFACTURING International Journal of Extreme Manufacturing Pub Date : 2024-02-22 DOI:10.1088/2631-7990/ad2c60
Wenyu Chen, Shiyuan Liu, Jinlong Zhu
{"title":"Pixelated non-volatile programmable photonic integrated circuits with 20-level intermediate states","authors":"Wenyu Chen, Shiyuan Liu, Jinlong Zhu","doi":"10.1088/2631-7990/ad2c60","DOIUrl":null,"url":null,"abstract":"\n Multi-level programmable photonic integrated circuits and optical metasurfaces have gained widespread attention in many fields, such as neuromorphic photonics, optical communications, and quantum information. In this paper, we propose pixelated programmable Si3N4 photonic integrated circuits with record-high 20-level intermediate states at 785 nm wavelength. Such flexibility in phase or amplitude modulation is achieved by a programmable Sb2S3 matrix, the footprint of whose elements can be as small as 1.2 μm, limited only by the optical diffraction limit of an in-house developed pulsed laser writing system. We believe, our work lays the foundation for laser-writing ultra-high-level (20 levels and even more) programmable photonic systems and metasurfaces based on phase change materials, which could catalyze diverse applications such as programmable neuromorphic photonics, biosensing, optical computing, photonic quantum computing, and reconfigurable metasurfaces.","PeriodicalId":52353,"journal":{"name":"International Journal of Extreme Manufacturing","volume":null,"pages":null},"PeriodicalIF":16.1000,"publicationDate":"2024-02-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal of Extreme Manufacturing","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1088/2631-7990/ad2c60","RegionNum":1,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"ENGINEERING, MANUFACTURING","Score":null,"Total":0}
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Abstract

Multi-level programmable photonic integrated circuits and optical metasurfaces have gained widespread attention in many fields, such as neuromorphic photonics, optical communications, and quantum information. In this paper, we propose pixelated programmable Si3N4 photonic integrated circuits with record-high 20-level intermediate states at 785 nm wavelength. Such flexibility in phase or amplitude modulation is achieved by a programmable Sb2S3 matrix, the footprint of whose elements can be as small as 1.2 μm, limited only by the optical diffraction limit of an in-house developed pulsed laser writing system. We believe, our work lays the foundation for laser-writing ultra-high-level (20 levels and even more) programmable photonic systems and metasurfaces based on phase change materials, which could catalyze diverse applications such as programmable neuromorphic photonics, biosensing, optical computing, photonic quantum computing, and reconfigurable metasurfaces.
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具有 20 级中间状态的像素化非易失性可编程光子集成电路
多级可编程光子集成电路和光学元表面在神经形态光子学、光通信和量子信息等许多领域受到广泛关注。在本文中,我们提出了像素化的可编程 Si3N4 光子集成电路,在 785 nm 波长下具有创纪录的 20 级中间态。这种相位或振幅调制的灵活性是通过可编程 Sb2S3 矩阵实现的,其元素的占位面积可小至 1.2 μm,仅受内部开发的脉冲激光写入系统的光衍射限制。我们相信,我们的工作为激光写入基于相变材料的超高层(20 层甚至更高)可编程光子系统和元表面奠定了基础,这将促进可编程神经形态光子学、生物传感、光学计算、光子量子计算和可重构元表面等多种应用。
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来源期刊
International Journal of Extreme Manufacturing
International Journal of Extreme Manufacturing Engineering-Industrial and Manufacturing Engineering
CiteScore
17.70
自引率
6.10%
发文量
83
审稿时长
12 weeks
期刊介绍: The International Journal of Extreme Manufacturing (IJEM) focuses on publishing original articles and reviews related to the science and technology of manufacturing functional devices and systems with extreme dimensions and/or extreme functionalities. The journal covers a wide range of topics, from fundamental science to cutting-edge technologies that push the boundaries of currently known theories, methods, scales, environments, and performance. Extreme manufacturing encompasses various aspects such as manufacturing with extremely high energy density, ultrahigh precision, extremely small spatial and temporal scales, extremely intensive fields, and giant systems with extreme complexity and several factors. It encompasses multiple disciplines, including machinery, materials, optics, physics, chemistry, mechanics, and mathematics. The journal is interested in theories, processes, metrology, characterization, equipment, conditions, and system integration in extreme manufacturing. Additionally, it covers materials, structures, and devices with extreme functionalities.
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