Evaluation of graphene microstructural and optical properties affected by high-temperature annealing and rapid cooling in a nitrogen-rich environment

Rohit Srivastava, Pankaj Kumar Singh, Pradeep Kumar Singh
{"title":"Evaluation of graphene microstructural and optical properties affected by high-temperature annealing and rapid cooling in a nitrogen-rich environment","authors":"Rohit Srivastava, Pankaj Kumar Singh, Pradeep Kumar Singh","doi":"10.1142/s0217984924501847","DOIUrl":null,"url":null,"abstract":"Annealing at high temperatures holds the possibility of concentrating defects in the graphene. Moreover, a significant increase in annealing temperature destroys the surface properties. In this work, the reduced graphene oxide (RGO) was prepared by an electrochemical technique with a high voltage ([Formula: see text][Formula: see text]V, [Formula: see text][Formula: see text]A). Then, the potential effects of impact on thermal treatment in a temperature range of 800–1000∘C in nitrogen-rich environment on the microstructure and surface morphology, thermal stability, phase and crystallinity, structural disorder, absorption properties, and optical properties of RGO for optoelectronic applications were investigated. In addition, a link was established between the estimated crystallite sizes determined by X-ray diffraction (XRD) and Raman data. The microstructural data indicate that the annealing temperature has a significant effect on the microstructure and carbon–oxygen (C/O) ratio. The C/O ratio increases as a function of annealing temperature. Atomic force microscope (AFM) analysis revealed that the root mean square (RMS) roughness of annealed RGO increases with increasing annealing temperature indicating an increase in crystallite size during annealing. Since most organic compounds were removed from the surface of the annealed RGO, oxygen functionalities appear to have minimal effect on the thermal stability of RGO. The size of graphene crystallites increases with annealing temperature, as shown by XRD observations. The crystalline structure was restored by annealing. The Raman results show that in the “low” defect density zone, the [Formula: see text] values increase because a larger defect density causes a stronger elastic scattering. UV–Vis spectroscopy shows that the absorption of RGO is not affected by annealing temperatures between 800∘C and 900∘C. The optical bandgap of annealed RGOs decreases from 4.08 to 3.72[Formula: see text]eV upon annealing in the temperature range of 800–1000∘C.","PeriodicalId":503716,"journal":{"name":"Modern Physics Letters B","volume":"43 5","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-01-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Modern Physics Letters B","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1142/s0217984924501847","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

Annealing at high temperatures holds the possibility of concentrating defects in the graphene. Moreover, a significant increase in annealing temperature destroys the surface properties. In this work, the reduced graphene oxide (RGO) was prepared by an electrochemical technique with a high voltage ([Formula: see text][Formula: see text]V, [Formula: see text][Formula: see text]A). Then, the potential effects of impact on thermal treatment in a temperature range of 800–1000∘C in nitrogen-rich environment on the microstructure and surface morphology, thermal stability, phase and crystallinity, structural disorder, absorption properties, and optical properties of RGO for optoelectronic applications were investigated. In addition, a link was established between the estimated crystallite sizes determined by X-ray diffraction (XRD) and Raman data. The microstructural data indicate that the annealing temperature has a significant effect on the microstructure and carbon–oxygen (C/O) ratio. The C/O ratio increases as a function of annealing temperature. Atomic force microscope (AFM) analysis revealed that the root mean square (RMS) roughness of annealed RGO increases with increasing annealing temperature indicating an increase in crystallite size during annealing. Since most organic compounds were removed from the surface of the annealed RGO, oxygen functionalities appear to have minimal effect on the thermal stability of RGO. The size of graphene crystallites increases with annealing temperature, as shown by XRD observations. The crystalline structure was restored by annealing. The Raman results show that in the “low” defect density zone, the [Formula: see text] values increase because a larger defect density causes a stronger elastic scattering. UV–Vis spectroscopy shows that the absorption of RGO is not affected by annealing temperatures between 800∘C and 900∘C. The optical bandgap of annealed RGOs decreases from 4.08 to 3.72[Formula: see text]eV upon annealing in the temperature range of 800–1000∘C.
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评估富氮环境下高温退火和快速冷却对石墨烯微观结构和光学特性的影响
高温退火有可能使石墨烯中的缺陷集中。此外,退火温度的大幅升高会破坏石墨烯的表面特性。在这项工作中,还原氧化石墨烯(RGO)是通过高电压电化学技术制备的([式:见正文][式:见正文]V,[式:见正文][式:见正文]A)。然后,研究了在富氮环境中 800-1000∘C 温度范围内进行热处理对 RGO 的微观结构和表面形貌、热稳定性、相和结晶度、结构无序性、吸收特性和光学特性的潜在影响。此外,通过 X 射线衍射(XRD)测定的估计晶粒大小与拉曼数据之间建立了联系。微观结构数据表明,退火温度对微观结构和碳氧(C/O)比有显著影响。碳氧比随退火温度的升高而增加。原子力显微镜(AFM)分析表明,退火后的 RGO 的均方根(RMS)粗糙度随着退火温度的升高而增加,表明退火过程中晶体尺寸增大。由于退火后的 RGO 表面大部分有机化合物已被去除,因此氧官能性对 RGO 热稳定性的影响似乎微乎其微。XRD 观察结果表明,石墨烯晶体的尺寸随着退火温度的升高而增大。退火后晶体结构得以恢复。拉曼结果表明,在 "低 "缺陷密度区,[公式:见正文]值会增加,因为较大的缺陷密度会导致较强的弹性散射。紫外可见光谱显示,RGO 的吸收不受 800∘C 至 900∘C 退火温度的影响。在 800-1000∘C 的退火温度范围内,退火后的 RGO 的光带隙从 4.08 降至 3.72[式中:见正文]eV。
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