{"title":"Enhancing the Sputtering Process with Plasma-Assisted Electrical Discharge for Thin Film Fabrication in Advanced Applications","authors":"","doi":"10.18576/ijtfst/130102","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":37038,"journal":{"name":"International Journal of Thin Film Science and Technology","volume":"25 3","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal of Thin Film Science and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.18576/ijtfst/130102","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"Materials Science","Score":null,"Total":0}
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