{"title":"Development of SiO2 UV-curable materials and their fine-patterning using sol-gel method","authors":"Zheng Li, Renjie Li, Zhuohong Feng, Zhezhe Wang","doi":"10.1007/s10043-024-00883-7","DOIUrl":null,"url":null,"abstract":"<p>UV curing hybrid materials via the photo polymerization have significant significance for the lithography fields due to the high resolution. In this work, the UV-curable SiO<sub>2</sub> materials with chelating compound structure are synthesized by photosensitive Sol–Gel approach, which have a wide absorption band at 267 nm. With the UV light irradiation, the chelating compound structure decomposes and the solubility of the film in organic solvent decreases. Based on this premise, the presented material exhibits the ability to fabricating highly ordered SiO<sub>2</sub> microarrays on several substrates through UV photolithography. The SiO<sub>2</sub> micro arrays can be used to as templates to prepare noble metal micro-structures, which own wide potential application prospects in highly ordered SERS substrates with high activity and reproductivity for trace detection.</p>","PeriodicalId":722,"journal":{"name":"Optical Review","volume":null,"pages":null},"PeriodicalIF":1.1000,"publicationDate":"2024-04-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Review","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1007/s10043-024-00883-7","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"OPTICS","Score":null,"Total":0}
引用次数: 0
Abstract
UV curing hybrid materials via the photo polymerization have significant significance for the lithography fields due to the high resolution. In this work, the UV-curable SiO2 materials with chelating compound structure are synthesized by photosensitive Sol–Gel approach, which have a wide absorption band at 267 nm. With the UV light irradiation, the chelating compound structure decomposes and the solubility of the film in organic solvent decreases. Based on this premise, the presented material exhibits the ability to fabricating highly ordered SiO2 microarrays on several substrates through UV photolithography. The SiO2 micro arrays can be used to as templates to prepare noble metal micro-structures, which own wide potential application prospects in highly ordered SERS substrates with high activity and reproductivity for trace detection.
期刊介绍：
Optical Review is an international journal published by the Optical Society of Japan. The scope of the journal is:
General and physical optics;
Quantum optics and spectroscopy;
Information optics;
Photonics and optoelectronics;
Biomedical photonics and biological optics;
Lasers;
Nonlinear optics;
Optical systems and technologies;
Optical materials and manufacturing technologies;
Vision;
Infrared and short wavelength optics;
Cross-disciplinary areas such as environmental, energy, food, agriculture and space technologies;
Other optical methods and applications.
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