Action of an Electron Beam on Crystals and Films of Aminium and Ammonium Salts

Abstract

The action of an electron beam on crystals of tetramethylethylenediaminium nitrilotriacetate [HMe₂NCH₂CH₂NMe₂H]²⁺[HN(CH₂COOH)(CH₂COO)₂]^–₂, ammonium heptamolybdate tetrahydrate (NH₄)₆Mo₇O₂₄‧4H₂O, and polymeric zinc nitrilotrimethylenephosphonate trihydrate (ZnH₄L‧3H₂O)_n, on a lamellar crystal of 2,2'-(ethylenedioxy)di(ethylaminium) trifluoroacetate CF₃C(O)O^{‒ +}H₃N(CH₂CH₂O)₂CH₂CH₂NH₃^+‒O(O)CCF₃, and on films of the monoethanolaminium salt of ethylenediaminetetraacetic acid [Н₃NCH₂CH₂OH]⁺₂[(OOCCH₂)₂NCH₂CH₂N(CH₂COOH)₂]^2– was studied. A Tescan VEGA II electron microscope was used as an exposure tool. The microrelief was examined at magnifications from 500× to 50000×. The survey was carried out at an accelerating voltage of 20 kV and a working distance of 2–8 mm, using secondary (SE) and backscattered (BSE) electron detectors. A copper–nickel alloy and silicate glass were used as the substrate material for the films. The crystals and films were irradiated with an electron beam of various powers, forming an area 20 × 20 μm in size. At low power, the area dimensions are strictly 20 × 20 μm, and the surface remains relatively flat. An increase in the power or in the exposure time while maintaining the power causes an increase in the size by 5 to 34%. The maximum impact causes the formation of defects in the form of cracks, swellings, bubbles, holes, and craters. The elevation of the surface increases with increasing radiation dose.