Luminescence of Oxide Films Obtained by Atomic Layer Deposition

IF 0.6 4区 材料科学 Q4 CRYSTALLOGRAPHY Crystallography Reports Pub Date : 2024-04-16 DOI:10.1134/s1063774523601211
A. P. Baraban, V. A. Dmitriev, A. V. Drozd, Yu. V. Petrov, I. E. Gabis, A. A. Selivanov
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Abstract

The possibilities of the luminescence method for studying Si–oxide and Si–SiO2–oxide structures have been demonstrated. A model of the electronic structure of Ta2O5 and TiO2 layers is proposed, which explains the shape of the spectral luminescence distribution independent of the excitation way. A comparison of the luminescence spectra of single oxide layers with the spectrum of Si–SiO2–oxide structures made it possible to draw conclusions about the interaction between layers during layered structure formation and estimate the band gap: 4.4 and 3.3 eV for Ta2O5 and TiO2, respectively. The formation of Ta2O5 on the SiO2 surface led to transformation in the SiO2 surface region, manifesting itself in weakening of the luminescence band at 1.9 eV and formation of defects (luminescence centers) in the vicinity of 3 eV. Synthesis of TiO2 on the surface of SiO2 was not accompanied by any changes in the luminescence spectra.

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通过原子层沉积获得的氧化物薄膜的发光特性
摘要 已证明发光法可用于研究 Si-oxide 和 Si-SiO2-oxide 结构。提出了 Ta2O5 和 TiO2 层的电子结构模型,该模型解释了发光光谱分布的形状与激发方式无关。通过比较单个氧化物层的发光光谱和 Si-SiO2-oxide 结构的光谱,可以得出层状结构形成过程中各层之间相互作用的结论,并估算出带隙:Ta2O5 和 TiO2 的带隙分别为 4.4 和 3.3 eV。在二氧化硅表面形成 Ta2O5 会导致二氧化硅表面区域发生转变,表现为 1.9 eV 处的发光带减弱,以及在 3 eV 附近形成缺陷(发光中心)。在二氧化硅表面合成二氧化钛时,发光光谱没有发生任何变化。
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来源期刊
Crystallography Reports
Crystallography Reports 化学-晶体学
CiteScore
1.10
自引率
28.60%
发文量
96
审稿时长
4-8 weeks
期刊介绍: Crystallography Reports is a journal that publishes original articles short communications, and reviews on various aspects of crystallography: diffraction and scattering of X-rays, electrons, and neutrons, determination of crystal structure of inorganic and organic substances, including proteins and other biological substances; UV-VIS and IR spectroscopy; growth, imperfect structure and physical properties of crystals; thin films, liquid crystals, nanomaterials, partially disordered systems, and the methods of studies.
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