T. G. Shikova, I. V. Kholodkov, S. A. Smirnov, B. L. Gorberg, M. O. Makeev, P. A. Mikhalev, A. S. Osipkov
{"title":"Kinetic Features of Plasma-Chemical Modification of Polyvinylidene Fluoride in Plasma","authors":"T. G. Shikova, I. V. Kholodkov, S. A. Smirnov, B. L. Gorberg, M. O. Makeev, P. A. Mikhalev, A. S. Osipkov","doi":"10.1134/s0018143924020127","DOIUrl":null,"url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>Changes in the composition of the surface layer of Nevaflon polyvinylidene fluoride film after treatment in gas discharges of various types (glow, dielectric barrier, corona) have been studied. The influence of the discharge type on the kinetics of etching and surface modification of polyvinylidene fluoride is shown. It has been found that the plasma treatment of polyvinylidene fluoride leads to a change in the modified surface layer of the polymer.</p>","PeriodicalId":12893,"journal":{"name":"High Energy Chemistry","volume":null,"pages":null},"PeriodicalIF":0.9000,"publicationDate":"2024-04-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"High Energy Chemistry","FirstCategoryId":"92","ListUrlMain":"https://doi.org/10.1134/s0018143924020127","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 0
Abstract
Changes in the composition of the surface layer of Nevaflon polyvinylidene fluoride film after treatment in gas discharges of various types (glow, dielectric barrier, corona) have been studied. The influence of the discharge type on the kinetics of etching and surface modification of polyvinylidene fluoride is shown. It has been found that the plasma treatment of polyvinylidene fluoride leads to a change in the modified surface layer of the polymer.
期刊介绍：
High Energy Chemistry publishes original articles, reviews, and short communications on molecular and supramolecular photochemistry, photobiology, radiation chemistry, plasma chemistry, chemistry of nanosized systems, chemistry of new atoms, processes and materials for optical information systems and other areas of high energy chemistry. It publishes theoretical and experimental studies in all areas of high energy chemistry, such as the interaction of high-energy particles with matter, the nature and reactivity of short-lived species induced by the action of particle and electromagnetic radiation or hot atoms on substances in their gaseous and condensed states, and chemical processes initiated in organic and inorganic systems by high-energy radiation.
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