Design of atomically dispersed N-Bi(3+x)+--OV sites in ultrathin Bi2O2CO3 nanosheets for efficient and durable visible-light-driven CO2 reduction

IF 4.7 2区 化学 Q2 CHEMISTRY, PHYSICAL Applied Catalysis A: General Pub Date : 2024-05-04 DOI:10.1016/j.apcata.2024.119776
Ningning Xu , Chenyu Li , Xinyan Lin , Xiaotong Lin , Xiaoyang Zhao , Junmin Nan , Xin Xiao
{"title":"Design of atomically dispersed N-Bi(3+x)+--OV sites in ultrathin Bi2O2CO3 nanosheets for efficient and durable visible-light-driven CO2 reduction","authors":"Ningning Xu ,&nbsp;Chenyu Li ,&nbsp;Xinyan Lin ,&nbsp;Xiaotong Lin ,&nbsp;Xiaoyang Zhao ,&nbsp;Junmin Nan ,&nbsp;Xin Xiao","doi":"10.1016/j.apcata.2024.119776","DOIUrl":null,"url":null,"abstract":"<div><p>The introduction of oxygen vacancies (OVs) into photocatalysts has proven to be a successful tactic to boost CO<sub>2</sub> reduction. However, the challenge lies in acquiring OV sites that are stable in the long term, highly dispersed, and tunable in concentration. Herein, an innovative configuration, referred to as N-Bi<sup>(3+x)+</sup>--O<sub>V,</sub> was developed for the model semiconductor Bi<sub>2</sub>O<sub>2</sub>CO<sub>3</sub> via an in situ anion doping approach. The structure enables the synthetic photocatalyst to exhibit superb CO<sub>2</sub> photoreduction performance, with approximately 100% CO selectivity and remarkable long-term stability. Experimental studies and density functional theory (DFT) calculations show that replacing O<sup>2-</sup> with N<sup>3-</sup> uniformly in the [Bi<sub>2</sub>O<sub>2</sub>]<sup>2+</sup> structural unit increases the chemical valence of Bi, elongates nearby Bi─O bonds, releases lattice O, improves CO<sub>2</sub> absorption, and decreases the energy barrier for the formation of the critical intermediate *COOH. This study offers new insights and potential opportunities for the development of reliable defect-type semiconductors and their catalytic applications.</p></div>","PeriodicalId":243,"journal":{"name":"Applied Catalysis A: General","volume":null,"pages":null},"PeriodicalIF":4.7000,"publicationDate":"2024-05-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Applied Catalysis A: General","FirstCategoryId":"1","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0926860X24002205","RegionNum":2,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 0

Abstract

The introduction of oxygen vacancies (OVs) into photocatalysts has proven to be a successful tactic to boost CO2 reduction. However, the challenge lies in acquiring OV sites that are stable in the long term, highly dispersed, and tunable in concentration. Herein, an innovative configuration, referred to as N-Bi(3+x)+--OV, was developed for the model semiconductor Bi2O2CO3 via an in situ anion doping approach. The structure enables the synthetic photocatalyst to exhibit superb CO2 photoreduction performance, with approximately 100% CO selectivity and remarkable long-term stability. Experimental studies and density functional theory (DFT) calculations show that replacing O2- with N3- uniformly in the [Bi2O2]2+ structural unit increases the chemical valence of Bi, elongates nearby Bi─O bonds, releases lattice O, improves CO2 absorption, and decreases the energy barrier for the formation of the critical intermediate *COOH. This study offers new insights and potential opportunities for the development of reliable defect-type semiconductors and their catalytic applications.

查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
在超薄 Bi2O2CO3 纳米片中设计原子分散的 N-Bi(3+x)+--OV位点,实现高效持久的可见光驱动型二氧化碳还原
事实证明,在光催化剂中引入氧空位(OVs)是促进二氧化碳还原的成功策略。然而,挑战在于如何获得长期稳定、高度分散且浓度可调的氧空位。在此,我们通过原位掺杂阴离子的方法,为模型半导体 Bi2O2CO3 开发了一种创新的构型,即 N-Bi(3+x)+--OV。这种结构使合成光催化剂表现出卓越的二氧化碳光还原性能,具有约 100% 的二氧化碳选择性和显著的长期稳定性。实验研究和密度泛函理论(DFT)计算表明,在[Bi2O2]2+ 结构单元中均匀地用 N3- 取代 O2-,可提高 Bi 的化合价,拉长附近的 Bi─O 键,释放晶格 O,改善 CO2 吸收,并降低形成临界中间体 *COOH 的能垒。这项研究为开发可靠的缺陷型半导体及其催化应用提供了新的见解和潜在机会。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
Applied Catalysis A: General
Applied Catalysis A: General 化学-环境科学
CiteScore
9.00
自引率
5.50%
发文量
415
审稿时长
24 days
期刊介绍: Applied Catalysis A: General publishes original papers on all aspects of catalysis of basic and practical interest to chemical scientists in both industrial and academic fields, with an emphasis onnew understanding of catalysts and catalytic reactions, new catalytic materials, new techniques, and new processes, especially those that have potential practical implications. Papers that report results of a thorough study or optimization of systems or processes that are well understood, widely studied, or minor variations of known ones are discouraged. Authors should include statements in a separate section "Justification for Publication" of how the manuscript fits the scope of the journal in the cover letter to the editors. Submissions without such justification will be rejected without review.
期刊最新文献
Vapor-phase intramolecular aldol condensation of 2,5-hexanedione over yttrium zirconate catalyst Trace Pt-loading transition metal hydroxides as efficient catalyst for vaporized hydrogen peroxide decomposition Inhibiting effects during the co-conversion of lauric acid and anisole over Ni and NiMo catalysts Self-coupling of electron acceptor units in conjugated microporous polymers strengthening local donor-acceptor interaction for improving photocatalytic activity Ni0 dominated Ni/MgAl-LDO catalyst for highly efficient reductive amination of acetone to isopropylamine
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1