Modification of Topological Surface States in Novel Mn1 – xAxBi2Te4/MnBi2Te4 (A = Si, Ge, Sn, Pb) Topological Systems

IF 1.4 4区 物理与天体物理 Q3 PHYSICS, MULTIDISCIPLINARY JETP Letters Pub Date : 2024-05-03 DOI:10.1134/S0021364023603706
T. P. Estyunina, A. V. Tarasov, A. V. Eryzhenkov, D. A. Estyunin, A. M. Shikin
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Abstract

The possibility of changing the bandgap value of topological surface states in materials based on the MnBi2Te4 intrinsic antiferromagnetic topological insulator is investigated using ab initio calculations. These materials are produced by the substitution of nonmagnetic chemical elements (A = Si, Ge, Sn, Pb) for magnetic metal atoms (Mn) in the surface (Mn1 – xAxBi2Te4/MnBi2Te4) septuple layer. The results exhibit a s-ignificant modulation of the bandgap in a wide range from 60 meV to 0 meV with an increase in the doping level x. Moreover, it is found that the bandgap behavior depends on a dopant. Namely, a monotonic dependence of the bandgap on x is found for Si and Ge, whereas the bandgap minimum at x = 0.75 exists for Sn and Pb. The results obtained in this work suggest that the main mechanism of the bandgap modulation in the materials under study is a change in the localization of topological surface states.

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新型 Mn1 - xAxBi2Te4/MnBi2Te4(A = Si、Ge、Sn、Pb)拓扑体系中拓扑表面态的改变
我们利用 ab initio 计算研究了改变基于 MnBi2Te4 本征反铁磁拓扑绝缘体材料中拓扑表面态带隙值的可能性。这些材料是通过在表面(Mn1 - xAxBi2Te4/MnBi2Te4)七层中用非磁性化学元素(A = Si、Ge、Sn、Pb)替代磁性金属原子(Mn)而产生的。结果表明,随着掺杂水平 x 的增加,带隙在 60 meV 到 0 meV 的宽范围内发生了显著的调制。也就是说,硅和锗的带隙与 x 呈单调关系,而锡和铅的带隙在 x = 0.75 时达到最小值。这项工作所获得的结果表明,所研究材料带隙调制的主要机制是拓扑表面态局部化的变化。
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来源期刊
JETP Letters
JETP Letters 物理-物理:综合
CiteScore
2.40
自引率
30.80%
发文量
164
审稿时长
3-6 weeks
期刊介绍: All topics of experimental and theoretical physics including gravitation, field theory, elementary particles and nuclei, plasma, nonlinear phenomena, condensed matter, superconductivity, superfluidity, lasers, and surfaces.
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