Creation of Submicrometer Magnetoresistive Tunnel Junction CoFeB/MgO/CoFeB Using an HSQ/PMMA Resistive Mask

IF 1.1 4区 材料科学 Q3 METALLURGY & METALLURGICAL ENGINEERING Physics of Metals and Metallography Pub Date : 2024-05-08 DOI:10.1134/s0031918x23602962
I. A. Fedotov, I. Yu. Pashen’kin, E. V. Skorokhodov, N. S. Gusev
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Abstract

The technology has been developed for manufacturing the magnetoresistive tunnel junction based on CoFeB/MgO/CoFeB layers with typical lateral sizes in the range from 200 to 700 nm by means of a set of HSQ/PMMA electronic resistive masks. To study the processes of magnetization reversal in the obtained samples, magnetoresistance curves are plotted. It is shown that elements with both vortex and quasi-uniform distributions of free layer magnetization are revealed, which depends on the structure of the magnetosensitive layer and the geometric parameters of the magnetoresistive tunnel junctions. Moreover, the width of the front of magnetization reversal in the elements with quasi-uniform distributions ranges from 2 to 6 Oe.

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利用 HSQ/PMMA 电阻掩模创建亚微米级磁阻隧道结 CoFeB/MgO/CoFeB
摘要 通过一套 HSQ/PMMA 电子电阻掩模,开发出了基于 CoFeB/MgO/CoFeB 层的磁阻隧道结制造技术,其典型横向尺寸范围为 200 至 700 nm。为了研究所获得样品的磁化反转过程,绘制了磁阻曲线。结果表明,自由层磁化的涡旋分布和准均匀分布都会显现出来,这取决于磁敏层的结构和磁阻隧道结的几何参数。此外,在具有准均匀分布的元件中,磁化反转前沿的宽度在 2 至 6 Oe 之间。
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来源期刊
Physics of Metals and Metallography
Physics of Metals and Metallography 工程技术-冶金工程
CiteScore
2.00
自引率
25.00%
发文量
108
审稿时长
3 months
期刊介绍: The Physics of Metals and Metallography (Fizika metallov i metallovedenie) was founded in 1955 by the USSR Academy of Sciences. Its scientific profile involves the theory of metals and metal alloys, their electrical and magnetic properties, as well as their structure, phase transformations, and principal mechanical properties. The journal also publishes scientific reviews and papers written by experts involved in fundamental, application, and technological studies. The annual volume of publications amounts to some 250 papers submitted from 100 leading national scientific institutions.
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