Renormalizing the high-harmonic interference via double-slit and grating.

Applied optics Pub Date : 2024-06-01 DOI:10.1364/AO.523629
Yukiaki Ishida, Makoto Kuwata-Gonokami
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引用次数: 0

Abstract

A method to utilize high-harmonic interference in Young's double-slit followed by a grating holds promise for precisely measuring the refractive-index spectrum in the extreme ultraviolet (EUV) region. The measurement is currently bottlenecked by the time it takes to fit the Fresnel interference patterns. The conventional fitting procedure, involving multiple numerical integrals for evaluating the EUV propagation through the slit and grating, takes ≳30min on a standard laptop computer, while the data acquisition time is ∼200s. Here, we apply an analytic Gaussian integral and bypass one of the numerical integrals associated with the grating. The analysis reduces to evaluating a renormalized EUV propagation in a simple double-slit interferometer, and the estimated fitting time on a laptop becomes as short as 112 s. Our study enables real-time analysis during measurements, facilitating mass optical-data collection of EUV lithography materials.

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通过双缝和光栅重新规范高次谐波干涉
利用杨氏双缝中的高次谐波干涉和光栅的方法有望精确测量极紫外(EUV)区域的折射率光谱。目前,菲涅尔干涉图案的拟合时间是测量的瓶颈。传统的拟合过程涉及多个数值积分,用于评估通过狭缝和光栅的 EUV 传播,在标准笔记本电脑上需要 ≳30 分钟,而数据采集时间则为∼200 秒。在这里,我们应用了解析高斯积分,并绕过了与光栅相关的一个数值积分。我们的研究实现了测量过程中的实时分析,从而促进了对超紫外光刻材料的大规模光学数据采集。
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