Edge smoothness enhancement of digital lithography based on the DMDs collaborative modulation

Abstract

The rough saw-tooth edge caused by the inherent microstructures of digital micromirror device (DMD) will reduce the quality of the lithography pattern. Comprehensively considering the manufacturing efficiency, precision and cost, we propose a DMDs collaborative modulation lithography method to improve the smoothness of the lithography pattern edge. Through combining two misaligned DMDs to collaboratively modulate exposure dose, the better edge smoothness can be achieved. Collaborative exposure with 1/2 DMD pixel misalignment and 1/4 DMD pixel misalignment are both implemented to form the step-shape lithography patterns. The experimental results show that the saw-tooth edge can approximate to a straight line when increasing the number of times of the collaborative exposure. Further error analysis indicates it is effective to improve the edge smoothness while ensuring the lithography quality by using the collaborative modulation lithography. These results indicate that the DMDs collaborative modulation lithography is a promising technique for fabrication of microstructures, which may be a solution for balancing the fabrication precision, efficiency and cost.