Triadic metal chalcogen HgBi2S3 nanoparticles as sensitizers for TiO2 thin film: SILAR synthesis and characterization

IF 1.9 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Bulletin of Materials Science Pub Date : 2024-06-17 DOI:10.1007/s12034-024-03198-0
Sachin Padwal, Rahul Wagh, Jivan Thakare, Rajendra Patil
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Abstract

The compound, mercury bismuth sulphide (HgBi2S3), represents a promising semiconductor within the II–V–VI group, demonstrating potential as a solar cell absorber layer. However, its synthesis and investigation through the successive ionic layer adsorption and reaction (SILAR) method have remained unexplored. This study focuses on the successful synthesis of HgBi2S3 nanoparticles using the SILAR technique atop wide band gap n-type semiconducting titanium dioxide (TiO2) thin films. Characterization via X-ray diffraction (XRD) confirmed the synthesis, revealing an average crystallite size of 93.83 nm. The lattice strain percentage was measured at 0.1467 with a dislocation density of 1.13 × 10−4 1/nm2. Scanning electron microscopy (SEM) analysis showcased the spherical morphology of the nanoparticles, exhibiting average sizes of 169, 238 and 329 nm corresponding to 5, 10 and 15 SILAR cycles, respectively. The thickness of the TiO2/HgBi2S3 composite thin film ranged from 12 to 18 µm. Notably, sensitizing the TiO2 film with HgBi2S3 nanoparticles resulted in a substantial reduction in the contact angle by ~24°. Optical studies demonstrated a significant decrease in the energy band gap of TiO2 from 3.06 to 1.6 eV post-sensitization with HgBi2S3 nanoparticles, indicating enhanced light absorption capabilities. Interestingly, the energy band gap of the TiO2/HgBi2S3 composite thin film remained consistent across different SILAR cycles. Moreover, electrochemical impedance spectroscopy and photoelectrochemical analyses revealed the intriguing performance characteristics of the TiO2/HgBi2S3 composite thin film, showcasing promising yet marginal enhancements.

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作为二氧化钛薄膜敏化剂的三元金属钙源 HgBi2S3 纳米粒子:SILAR 合成与表征
硫化汞铋(HgBi2S3)化合物是 II-V-VI 族中一种很有前途的半导体,具有作为太阳能电池吸收层的潜力。然而,通过连续离子层吸附和反应(SILAR)方法合成和研究该化合物的工作仍未开展。本研究的重点是利用 SILAR 技术在宽带隙 n 型半导体二氧化钛(TiO2)薄膜上成功合成 HgBi2S3 纳米粒子。通过 X 射线衍射 (XRD) 表征证实了合成结果,显示平均结晶尺寸为 93.83 nm。测得晶格应变百分比为 0.1467,位错密度为 1.13 × 10-4 1/nm2。扫描电子显微镜(SEM)分析显示了纳米颗粒的球形形态,其平均尺寸分别为 169、238 和 329 nm,与 5、10 和 15 个 SILAR 周期相对应。TiO2/HgBi2S3 复合薄膜的厚度为 12 至 18 µm。值得注意的是,用 HgBi2S3 纳米粒子敏化 TiO2 薄膜后,接触角大大降低了约 24°。光学研究表明,使用 HgBi2S3 纳米粒子敏化后,TiO2 的能带隙从 3.06 eV 显著下降到 1.6 eV,这表明其光吸收能力得到了增强。有趣的是,在不同的 SILAR 周期中,TiO2/HgBi2S3 复合薄膜的能带间隙保持一致。此外,电化学阻抗谱分析和光电化学分析揭示了 TiO2/HgBi2S3 复合薄膜引人入胜的性能特点,显示出有前景但微不足道的改进。
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来源期刊
Bulletin of Materials Science
Bulletin of Materials Science 工程技术-材料科学:综合
CiteScore
3.40
自引率
5.60%
发文量
209
审稿时长
11.5 months
期刊介绍: The Bulletin of Materials Science is a bi-monthly journal being published by the Indian Academy of Sciences in collaboration with the Materials Research Society of India and the Indian National Science Academy. The journal publishes original research articles, review articles and rapid communications in all areas of materials science. The journal also publishes from time to time important Conference Symposia/ Proceedings which are of interest to materials scientists. It has an International Advisory Editorial Board and an Editorial Committee. The Bulletin accords high importance to the quality of articles published and to keep at a minimum the processing time of papers submitted for publication.
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