Enhanced interlayer electron transfer by surface treatments in mixed-dimensional van der Waals semiconductor heterostructures

IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY APL Materials Pub Date : 2024-06-26 DOI:10.1063/5.0214718
Takeshi Odagawa, Sota Yamamoto, Chaoliang Zhang, Kazuki Koyama, Jun Ishihara, Giacomo Mariani, Yoji Kunihashi, Haruki Sanada, Junsaku Nitta, Makoto Kohda
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Abstract

We investigate the excitonic species in WS2 monolayers transferred onto III–V semiconductor substrates with different surface treatments. When the III–V substrates were covered with amorphous native oxides, negatively charged excitons dominated the spectral weight in low-temperature near-resonance photoluminescence (PL) measurements. However, when the native oxides of the III–V substrates were reduced, neutral excitons began to dominate the spectral weight, indicating a reduction in the electron density in the WS2 monolayers. The removal of the native oxides enhanced the electron transfer from the WS2 monolayer to the III–V substrate. In addition, an additional shoulder-like PL feature appeared ∼50 meV below the emission of neutral excitons, which can be attributed to the emission of localized excitons. When the III–V substrate surface was passivated by sulfur after the reduction of the native oxides, neutral excitons still dominated the spectral weight. However, the low-energy PL shoulder disappeared again, suggesting the effective delocalization of excitons through substrate surface passivation. Surface engineering of the semiconductor substrates for two-dimensional (2D) materials can provide a novel approach to control the carrier density of the 2D materials, implement deterministic carrier localization or delocalization for the 2D materials, and facilitate the interlayer transfer of charge, spin, and valley currents. These findings open the avenue for novel device concepts and phenomena in mixed-dimensional semiconductor heterostructures.
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在混合维范德华半导体异质结构中通过表面处理增强层间电子转移
我们研究了转移到经过不同表面处理的 III-V 族半导体衬底上的 WS2 单层中的激子种类。当 III-V 族基底被无定形原生氧化物覆盖时,带负电荷的激子在低温近共振光致发光(PL)测量的光谱权重中占主导地位。然而,当 III-V 族基底的原生氧化物被还原时,中性激子开始主导光谱权重,这表明 WS2 单层中的电子密度降低了。去除原生氧化物增强了从 WS2 单层到 III-V 基底的电子转移。此外,在中性激子发射的下方 50 meV 处出现了一个额外的肩状聚光特征,这可以归因于局部激子的发射。在还原原生氧化物后,用硫对 III-V 基底表面进行钝化处理,中性激子仍然主导光谱权重。然而,低能 PL 肩再次消失,这表明激子通过衬底表面钝化实现了有效的去局域化。二维(2D)材料半导体衬底的表面工程可以提供一种新方法来控制二维材料的载流子密度,实现二维材料的确定性载流子定位或去定位,并促进电荷、自旋和谷电流的层间转移。这些发现为混合二维半导体异质结构中的新型器件概念和现象开辟了道路。
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来源期刊
APL Materials
APL Materials NANOSCIENCE & NANOTECHNOLOGYMATERIALS SCIE-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
9.60
自引率
3.30%
发文量
199
审稿时长
2 months
期刊介绍: APL Materials features original, experimental research on significant topical issues within the field of materials science. In order to highlight research at the forefront of materials science, emphasis is given to the quality and timeliness of the work. The journal considers theory or calculation when the work is particularly timely and relevant to applications. In addition to regular articles, the journal also publishes Special Topics, which report on cutting-edge areas in materials science, such as Perovskite Solar Cells, 2D Materials, and Beyond Lithium Ion Batteries.
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