Orthotropic rotational semiconductor material with piezo‐photothermal plasma waves with moisture plasma diffusion and laser pulse

M. Adel, Khaled Lotfy, Anand Kumar Yadav, E. Ibrahim
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Abstract

The objective of this study is to investigate the effects of rotation field on a semiconductor material with general photo‐piezo‐thermo‐elastic characteristics. The primary goal is to analyze how the semiconductor behaves under and laser pulse effect. The research assumes that the piezo‐semiconductor medium being studied is uniform and has consistent orthotropic properties when it is subjected to photo‐thermal excitation according to moisture plasma diffusion processes. The piezoelectric phenomenon's impact can be determined by employing Gauss's law of electrostatics. Several important variables, including temperature distribution field, carrier density from both types of moisture, electric potential displacement, and stress components, have been precisely calculated using the normal mode approach. The study uses graphical representation to show how the physical field distribution changes with different times, rotation parameters, and thermal conductivity. The findings indicate that various factors, including time, thermal coupling parameter, and rotation field, have a significant impact on the amplitude of the distribution profile, and align with the observed physical outcomes. These factors must be taken into consideration when analyzing and designing piezo‐semiconductors.
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各向同性旋转半导体材料与带湿气等离子体扩散和激光脉冲的压电光热等离子体波
本研究旨在探讨旋转磁场对具有一般光压电热弹性特性的半导体材料的影响。主要目标是分析半导体在激光脉冲效应下的表现。研究假设所研究的压电半导体介质是均匀的,并且在根据湿等离子体扩散过程受到光热激励时具有一致的正交特性。压电现象的影响可通过使用高斯静电定律来确定。采用法向模式方法精确计算了几个重要变量,包括温度分布场、两种湿气的载流子密度、电动势位移和应力分量。研究采用图形表示法显示了物理场分布如何随时间、旋转参数和热导率的不同而变化。研究结果表明,包括时间、热耦合参数和旋转磁场在内的各种因素对分布轮廓的振幅有重大影响,并与观测到的物理结果相一致。在分析和设计压电半导体时必须考虑这些因素。
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