A structural analysis of ordered Cs$_{3}$Sb films grown on single crystal graphene and silicon carbide substrates

C. Pennington, M. Gaowei, E. M. Echeverria, K. Evans-Lutterodt, A. Galdi, T. Juffmann, S. Karkare, J. Maxson, S. J. van der Molen, P. Saha, J. Smedley, W. G. Stam, R. M. Tromp
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Abstract

Alkali antimonides are well established as high efficiency, low intrinsic emittance photocathodes for accelerators and photon detectors. However, conventionally grown alkali antimonide films are polycrystalline with surface disorder and roughness that can limit achievable beam brightness. Ordering the crystalline structure of alkali antimonides has the potential to deliver higher brightness electron beams by reducing surface disorder and enabling the engineering of material properties at the level of atomic layers. In this report, we demonstrate the growth of ordered Cs$_{3}$Sb films on single crystal substrates 3C-SiC and graphene-coated 4H-SiC using pulsed laser deposition and conventional thermal evaporation growth techniques. The crystalline structures of the Cs$_{3}$Sb films were examined using reflection high energy electron diffraction (RHEED) and X-ray diffraction (XRD) diagnostics, while film thickness and roughness estimates were made using x-ray reflectivity (XRR). With these tools, we observed ordered domains in less than 10 nm thick films with quantum efficiencies greater than one percent at 530 nm. Moreover, we identify structural features such as Laue oscillations indicative of highly ordered films. We found that Cs$_{3}$Sb films grew with flat, fiber-textured surfaces on 3C-SiC and with multiple ordered domains and sub-nanometer surface roughness on graphene-coated 4H-SiC under our growth conditions. We identify the crystallographic orientations of Cs$_{3}$Sb grown on graphene-coated 4H-SiC substrates and discuss the significance of examining the crystal structure of these films for growing epitaxial heterostructures in future experiments.
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在单晶石墨烯和碳化硅衬底上生长的有序铯_{3}_锑薄膜的结构分析
碱锑化物作为加速器和光子探测器的高效率、低本征辐照度光电阴极已得到广泛认可。然而,传统生长的碱锑化合物薄膜是多晶体的,其表面的无序性和粗糙度会限制可实现的光束亮度。对碱锑化物的晶体结构进行有序化处理,可以减少表面无序状态,并在原子层水平上对材料特性进行工程设计,从而有可能产生更高亮度的电子束。在本报告中,我们利用脉冲激光沉积和传统热蒸发生长技术,在单晶基底 3C-SiC 和石墨烯涂层 4H-SiC 上生长出了有序的 Cs$_{3}$Sb 薄膜。我们使用反射高能电子衍射 (RHEED) 和 X 射线衍射 (XRD) 诊断技术对 Cs$_{3}$Sb 薄膜的晶体结构进行了检测,同时使用 X 射线反射率 (XRR) 对薄膜厚度和粗糙度进行了估计。此外,我们还发现了表明薄膜高度有序的 Laue 振荡等结构特征。我们发现,在 3C-SiC 上生长的铯_{3}$Sb 薄膜具有平整的纤维纹理表面,而在我们的生长条件下,在石墨烯涂层 4H-SiC 上生长的铯_{3}$Sb 薄膜具有多个有序畴和亚纳米级的表面粗糙度。我们确定了在石墨烯涂层 4H-SiC 基质上生长的 Cs$_{3}$Sb 的晶体取向,并讨论了在未来实验中研究这些薄膜的晶体结构对于生长外延异质结构的意义。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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