Ligand Engineering for Indium-Based III–V Semiconductor Nanocrystals: A Review on Recent Process

IF 2.9 4区 工程技术 Q2 CHEMISTRY, MULTIDISCIPLINARY Korean Journal of Chemical Engineering Pub Date : 2024-07-27 DOI:10.1007/s11814-024-00235-w
Hyunwoo Jo, Moon Sung Kang
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Abstract

This review provides a comprehensive overview of recent ligand engineering strategies for indium-based III–V semiconductor nanocrystals (NCs), focusing specifically on indium phosphide (InP) and indium arsenide (InAs). These materials have gained significant research interest as active substances compliant with the restriction of hazardous substances directive (RoHS) for advanced optoelectronic applications. Ligands attached to the NC surfaces play critical roles in determining the physical characteristics of the materials, including their structure, size, colloidal stability, electronic properties, and associated optophysical processes. Hence, practical applications of InP and InAs NCs require a good understanding of these ligands. Moreover, recent advances have demonstrated the importance of selecting appropriate ligands for enhancing the electronic and optical performances of InP and InAs NC-based electronic devices such as thin-film transistors, photovoltaic devices, photodetectors, and light-emitting devices. This review highlights the recent progress, technical challenges, and future directions in the context of ligand engineering to realize high-performance InP and InAs NC-based electronic devices.

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铟基 III-V 半导体纳米晶体的配体工程:最新工艺综述
本综述全面概述了最近针对铟基 III-V 族半导体纳米晶体(NCs)的配体工程策略,尤其侧重于磷化铟(InP)和砷化铟(InAs)。这些材料作为符合有害物质限制指令(RoHS)的活性物质,在先进光电应用领域获得了极大的研究兴趣。附着在 NC 表面的配体在决定材料的物理特性(包括其结构、尺寸、胶体稳定性、电子特性和相关的光物理过程)方面起着至关重要的作用。因此,InP 和 InAs NC 的实际应用需要充分了解这些配体。此外,最近的研究进展表明,选择合适的配体对于提高基于 InP 和 InAs NC 的电子器件(如薄膜晶体管、光伏器件、光电探测器和发光器件)的电子和光学性能非常重要。本综述重点介绍了配体工程在实现基于 InP 和 InAs NC 的高性能电子器件方面的最新进展、技术挑战和未来方向。
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来源期刊
Korean Journal of Chemical Engineering
Korean Journal of Chemical Engineering 工程技术-工程:化工
CiteScore
4.60
自引率
11.10%
发文量
310
审稿时长
4.7 months
期刊介绍: The Korean Journal of Chemical Engineering provides a global forum for the dissemination of research in chemical engineering. The Journal publishes significant research results obtained in the Asia-Pacific region, and simultaneously introduces recent technical progress made in other areas of the world to this region. Submitted research papers must be of potential industrial significance and specifically concerned with chemical engineering. The editors will give preference to papers having a clearly stated practical scope and applicability in the areas of chemical engineering, and to those where new theoretical concepts are supported by new experimental details. The Journal also regularly publishes featured reviews on emerging and industrially important subjects of chemical engineering as well as selected papers presented at international conferences on the subjects.
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