Investigating the influence of chromium layer thickness on thermal stability, adhesion and agglomeration of Cr/Ag/Cr sandwich layers in microelectromechanical systems (MEMS)

Hossein Ghazavi, M. Kolahdoozan, Nosratollah Solhjoei, Mohammad Saadat, Sayed Hasan Mirtalaie
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Abstract

This study explores the influence of chromium layer thickness on the thermal stability and agglomeration of Cr/Ag/Cr sandwich layers used in MEMS applications. Achieving uniform and consistent deposition of thin films is crucial for optimal device performance. Magnetron sputtering, a technique offering precise control over film properties, is commonly employed for depositing thin films in MEMS. Silver is a popular choice due to its desirable properties, but it tends to agglomerate at high temperatures. The researchers investigated the effect of chromium layer thickness on thermal stability and agglomeration. They deposited chromium layers of varying thicknesses onto silicon substrates, followed by a silver layer and another chromium layer to create a sandwich structure. Annealing was performed at different temperatures to assess thermal stability and prevent silver agglomeration. Thermal stability was evaluated by measuring electrical resistance using a four-point probe method, and surface topography was analyzed using a non-contact atomic force microscope. The goal was to identify the optimal chromium layer thickness to minimize agglomeration and maximize thermal stability. The results showed that a sandwich structure with a 5 nm top chromium layer (Si/Cr (5 nm)/Ag (100 nm)/Cr (5-10-15-20 nm)) exhibited decreased adhesion force with increasing annealing temperatures. The use of a chromium sandwich layer significantly reduced surface roughness, as indicated by reductions in Ra and RMS values. A 15 nm thick chromium layer above and below the silver layer provided the best thermal stability and prevented silver agglomeration, resulting in the highest degree of adhesion. This thickness also yielded optimal surface parameters for the chromium sandwich layers at the annealing temperatures. In conclusion, the study demonstrates that the thickness of the chromium layer influences thermal stability, agglomeration, and surface parameters in MEMS applications and enables better control over thin film deposition.
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研究铬层厚度对微机电系统 (MEMS) 中 Cr/Ag/Cr 夹层的热稳定性、附着力和团聚的影响
本研究探讨了铬层厚度对 MEMS 应用中使用的 Cr/Ag/Cr 夹层的热稳定性和团聚的影响。实现均匀一致的薄膜沉积对于优化设备性能至关重要。磁控溅射是一种可精确控制薄膜特性的技术,通常用于 MEMS 薄膜的沉积。银因其理想的特性而备受青睐,但它在高温下容易结块。研究人员研究了铬层厚度对热稳定性和结块的影响。他们在硅基底上沉积了不同厚度的铬层,然后再沉积一层银和另一层铬,以形成三明治结构。在不同温度下进行退火,以评估热稳定性和防止银结块。使用四点探针法测量电阻来评估热稳定性,并使用非接触式原子力显微镜分析表面形貌。目的是确定最佳铬层厚度,以最大限度地减少结块并提高热稳定性。结果表明,顶层铬层为 5 nm 的夹层结构(Si/Cr (5 nm)/Ag (100 nm)/Cr (5-10-15-20 nm))随着退火温度的升高,粘附力下降。铬夹层的使用大大降低了表面粗糙度,Ra 值和 RMS 值均有所降低。银层上方和下方 15 纳米厚的铬层具有最佳的热稳定性,可防止银结块,从而产生最高的附着力。在退火温度下,这一厚度还能为铬夹层提供最佳的表面参数。总之,这项研究表明,铬层的厚度会影响 MEMS 应用中的热稳定性、团聚和表面参数,并能更好地控制薄膜沉积。
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