Sunil Kumar Tiwari, Akula Umamaheswara Rao, Piyush Chandra Verma, Gaurav Pant, Devesh Kumar Avasthi, Sudip Sen, Amit Kumar Chawla
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引用次数: 0
Abstract
Ni3Al films were deposited on silicon (100) substrate at different substrate temperatures by DC magnetron sputtering. The evolution of phase, microstructure, surface topography and mechanical prope...
期刊介绍：
The Journal covers a wide range of topics under radiation and plasma sciences. The range of contributions encompasses: radiation physics; radiochemistry, radiobiology and physical effects of medical irradiation, including research on radiative cell degeneration; optical, electrical and mechanical effects of radiation, and their secondary effects such as diffusion and particle emission from surfaces; plasma techniques and plasma phenomena. On plasma science the Journal covers all areas of fusion, space and low temperature plasmas.
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