{"title":"Influence of O2 content on surface modification of epoxy resin using He/CF4 atmospheric pressure plasma jet to improve surface flashover strength","authors":"Lijun Wang, Huan Zhao, Jie Liu, Yile Wang","doi":"10.1063/5.0218575","DOIUrl":null,"url":null,"abstract":"In order to improve the surface flashover strength of the insulation materials and solve the problem that the relatively high price of CF4 restricts the large-scale application of fluorination modification of CF4 atmospheric pressure plasma jet (APPJ) in the industrial field, He/CF4/O2 APPJ with different O2 content is used to treat epoxy resin (EP) dielectric material. By analyzing the results of scanning electron microscopy, atomic force microscopy, and x-ray photoelectron spectroscopy, the influence of O2 content on the multiple characteristics of EP surface before and after APPJ treatment is studied. Flashover experiment is also carried out on EP surface before and after APPJ treatment. It is found that the addition of 0.1% O2 can increase the mature voltage of the EP surface by about 16.10% compared with untreated EP surface. It is concluded that the improvement of the surface flashover strength with a small amount of O2 (within 0.1%) is influenced by the surface roughness and chemical composition of the dielectric. The deposition effect of APPJ on EP surface is enhanced to increase the surface roughness and reaches the best at 0.1% O2, because the addition of excessive O2 will weaken the APPJ intensity. It is speculated that the creepage distance of the EP surface is increased to inhibit the formation of electron collapse and the content of electronegative fluorine and oxygen on the EP surface is increased under a small amount of O2 addition, resulting in the inhibition of the formation of surface flashover.","PeriodicalId":20175,"journal":{"name":"Physics of Plasmas","volume":"28 1","pages":""},"PeriodicalIF":2.0000,"publicationDate":"2024-08-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Physics of Plasmas","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1063/5.0218575","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"PHYSICS, FLUIDS & PLASMAS","Score":null,"Total":0}
引用次数: 0
Abstract
In order to improve the surface flashover strength of the insulation materials and solve the problem that the relatively high price of CF4 restricts the large-scale application of fluorination modification of CF4 atmospheric pressure plasma jet (APPJ) in the industrial field, He/CF4/O2 APPJ with different O2 content is used to treat epoxy resin (EP) dielectric material. By analyzing the results of scanning electron microscopy, atomic force microscopy, and x-ray photoelectron spectroscopy, the influence of O2 content on the multiple characteristics of EP surface before and after APPJ treatment is studied. Flashover experiment is also carried out on EP surface before and after APPJ treatment. It is found that the addition of 0.1% O2 can increase the mature voltage of the EP surface by about 16.10% compared with untreated EP surface. It is concluded that the improvement of the surface flashover strength with a small amount of O2 (within 0.1%) is influenced by the surface roughness and chemical composition of the dielectric. The deposition effect of APPJ on EP surface is enhanced to increase the surface roughness and reaches the best at 0.1% O2, because the addition of excessive O2 will weaken the APPJ intensity. It is speculated that the creepage distance of the EP surface is increased to inhibit the formation of electron collapse and the content of electronegative fluorine and oxygen on the EP surface is increased under a small amount of O2 addition, resulting in the inhibition of the formation of surface flashover.
期刊介绍:
Physics of Plasmas (PoP), published by AIP Publishing in cooperation with the APS Division of Plasma Physics, is committed to the publication of original research in all areas of experimental and theoretical plasma physics. PoP publishes comprehensive and in-depth review manuscripts covering important areas of study and Special Topics highlighting new and cutting-edge developments in plasma physics. Every year a special issue publishes the invited and review papers from the most recent meeting of the APS Division of Plasma Physics. PoP covers a broad range of important research in this dynamic field, including:
-Basic plasma phenomena, waves, instabilities
-Nonlinear phenomena, turbulence, transport
-Magnetically confined plasmas, heating, confinement
-Inertially confined plasmas, high-energy density plasma science, warm dense matter
-Ionospheric, solar-system, and astrophysical plasmas
-Lasers, particle beams, accelerators, radiation generation
-Radiation emission, absorption, and transport
-Low-temperature plasmas, plasma applications, plasma sources, sheaths
-Dusty plasmas