Influence of O2 content on surface modification of epoxy resin using He/CF4 atmospheric pressure plasma jet to improve surface flashover strength

IF 2 3区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS Physics of Plasmas Pub Date : 2024-08-05 DOI:10.1063/5.0218575
Lijun Wang, Huan Zhao, Jie Liu, Yile Wang
{"title":"Influence of O2 content on surface modification of epoxy resin using He/CF4 atmospheric pressure plasma jet to improve surface flashover strength","authors":"Lijun Wang, Huan Zhao, Jie Liu, Yile Wang","doi":"10.1063/5.0218575","DOIUrl":null,"url":null,"abstract":"In order to improve the surface flashover strength of the insulation materials and solve the problem that the relatively high price of CF4 restricts the large-scale application of fluorination modification of CF4 atmospheric pressure plasma jet (APPJ) in the industrial field, He/CF4/O2 APPJ with different O2 content is used to treat epoxy resin (EP) dielectric material. By analyzing the results of scanning electron microscopy, atomic force microscopy, and x-ray photoelectron spectroscopy, the influence of O2 content on the multiple characteristics of EP surface before and after APPJ treatment is studied. Flashover experiment is also carried out on EP surface before and after APPJ treatment. It is found that the addition of 0.1% O2 can increase the mature voltage of the EP surface by about 16.10% compared with untreated EP surface. It is concluded that the improvement of the surface flashover strength with a small amount of O2 (within 0.1%) is influenced by the surface roughness and chemical composition of the dielectric. The deposition effect of APPJ on EP surface is enhanced to increase the surface roughness and reaches the best at 0.1% O2, because the addition of excessive O2 will weaken the APPJ intensity. It is speculated that the creepage distance of the EP surface is increased to inhibit the formation of electron collapse and the content of electronegative fluorine and oxygen on the EP surface is increased under a small amount of O2 addition, resulting in the inhibition of the formation of surface flashover.","PeriodicalId":20175,"journal":{"name":"Physics of Plasmas","volume":"28 1","pages":""},"PeriodicalIF":2.0000,"publicationDate":"2024-08-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Physics of Plasmas","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1063/5.0218575","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"PHYSICS, FLUIDS & PLASMAS","Score":null,"Total":0}
引用次数: 0

Abstract

In order to improve the surface flashover strength of the insulation materials and solve the problem that the relatively high price of CF4 restricts the large-scale application of fluorination modification of CF4 atmospheric pressure plasma jet (APPJ) in the industrial field, He/CF4/O2 APPJ with different O2 content is used to treat epoxy resin (EP) dielectric material. By analyzing the results of scanning electron microscopy, atomic force microscopy, and x-ray photoelectron spectroscopy, the influence of O2 content on the multiple characteristics of EP surface before and after APPJ treatment is studied. Flashover experiment is also carried out on EP surface before and after APPJ treatment. It is found that the addition of 0.1% O2 can increase the mature voltage of the EP surface by about 16.10% compared with untreated EP surface. It is concluded that the improvement of the surface flashover strength with a small amount of O2 (within 0.1%) is influenced by the surface roughness and chemical composition of the dielectric. The deposition effect of APPJ on EP surface is enhanced to increase the surface roughness and reaches the best at 0.1% O2, because the addition of excessive O2 will weaken the APPJ intensity. It is speculated that the creepage distance of the EP surface is increased to inhibit the formation of electron collapse and the content of electronegative fluorine and oxygen on the EP surface is increased under a small amount of O2 addition, resulting in the inhibition of the formation of surface flashover.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
氧气含量对使用 He/CF4 常压等离子体射流改性环氧树脂表面以提高表面闪蒸强度的影响
为了提高绝缘材料的表面闪蒸强度,解决CF4价格较高制约CF4常压等离子体射流(APPJ)氟化改性在工业领域大规模应用的问题,采用不同O2含量的He/CF4/O2 APPJ处理环氧树脂(EP)介电材料。通过分析扫描电子显微镜、原子力显微镜和 X 射线光电子能谱的结果,研究了氧气含量对 APPJ 处理前后环氧树脂表面多种特性的影响。还对 APPJ 处理前后的 EP 表面进行了闪蒸实验。结果发现,与未处理的 EP 表面相比,添加 0.1% 的 O2 可使 EP 表面的成熟电压提高约 16.10%。由此得出结论,少量氧气(0.1% 以内)对表面闪蒸强度的改善受表面粗糙度和电介质化学成分的影响。APPJ 在 EP 表面的沉积效果会随着表面粗糙度的增加而增强,并在 0.1% O2 时达到最佳效果,因为过量的 O2 会削弱 APPJ 的强度。据推测,在添加少量 O2 的情况下,EP 表面的爬电距离增加以抑制电子塌缩的形成,EP 表面的负电性氟和氧含量增加,从而抑制了表面闪蒸的形成。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
Physics of Plasmas
Physics of Plasmas 物理-物理:流体与等离子体
CiteScore
4.10
自引率
22.70%
发文量
653
审稿时长
2.5 months
期刊介绍: Physics of Plasmas (PoP), published by AIP Publishing in cooperation with the APS Division of Plasma Physics, is committed to the publication of original research in all areas of experimental and theoretical plasma physics. PoP publishes comprehensive and in-depth review manuscripts covering important areas of study and Special Topics highlighting new and cutting-edge developments in plasma physics. Every year a special issue publishes the invited and review papers from the most recent meeting of the APS Division of Plasma Physics. PoP covers a broad range of important research in this dynamic field, including: -Basic plasma phenomena, waves, instabilities -Nonlinear phenomena, turbulence, transport -Magnetically confined plasmas, heating, confinement -Inertially confined plasmas, high-energy density plasma science, warm dense matter -Ionospheric, solar-system, and astrophysical plasmas -Lasers, particle beams, accelerators, radiation generation -Radiation emission, absorption, and transport -Low-temperature plasmas, plasma applications, plasma sources, sheaths -Dusty plasmas
期刊最新文献
Toroidal Alfvén mode instability driven by plasma current in low-density Ohmic plasmas of the spherical tori Numerical investigations of spatiotemporal dynamics of space-charge limited collisional sheaths Design and modeling of indirectly driven magnetized implosions on the NIF Analytical model of a Hall thruster Influence of N2 admixture on mode transition of discharge in N2–Ar helicon plasma
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1