Microstructure and Mechanical Properties of Low Stacking-Fault Energy Cu-Based Alloy Wires

Satoshi Semboshi, Ryusei Arauchi, Yasuyuki Kaneno, Sung Hwan Lim, Eun-Ae Choi, Seung Zeon Han
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Abstract

Innovations in electronic devices and their capabilities have driven the demand for improved conductive materials relevant to device fabrication. To gain insights on developing solid solution-type Cu alloy thin wires with a superior balance of strength and conductivity, this study investigated variations in the microstructures and properties of pure Cu wires and Cu–5 at. pct Zn, Cu–5 at. pct Al, and Cu–5 at. pct In alloy wires during intense drawing and analyzed the effects of stacking-fault energy (SFE) of Cu alloys on their microstructural evolution. During the initial drawing stages, lower SFE Cu–5 at. pct Al and Cu–5 at. pct In alloys yielded more high-density deformation twins than pure Cu and Cu–5 at. pct Zn. Deformation twins promoted grain refinement during drawing. Effective grain refinement and dislocation accumulation during drawing in low-SFE Cu alloys substantially strengthened them without adversely impacting electrical conductivity. During intense drawing in the Cu–5 at. pct In alloy wires, ultrafine fibrous grains (diameter ~ 80 nm) and a high-dislocation density yielded excellent tensile strength and conductivity. These results indicate that adjusting the solute element content in Cu matrix to reduce SFE and optimizing deformation strain via wire drawing significantly improve alloy wire performance.

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低堆积断层能铜基合金丝的微观结构和力学性能
电子设备及其功能的创新推动了对与设备制造相关的改良导电材料的需求。为了深入了解如何开发强度和导电性兼顾的固溶型铜合金细丝,本研究调查了纯铜丝以及 Cu-5 at.在初始拉拔阶段,与纯铜和 Cu-5 at. pct Zn 相比,较低 SFE 的 Cu-5 at.变形孪晶促进了拉拔过程中的晶粒细化。低 SFE 铜合金在拉拔过程中有效的晶粒细化和位错累积大大增强了合金的强度,而不会对导电性产生不利影响。在 Cu-5 at. pct In 合金线材的强力拉拔过程中,超细纤维晶粒(直径约 80 nm)和高位错密度产生了优异的抗拉强度和导电性。这些结果表明,调整铜基体中的溶质元素含量以降低 SFE,并通过拉丝优化变形应变,可显著提高合金丝的性能。
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