Tunable sub-threshold current firing via insulator-to-metal transition enabled by lithographic nanochannels for neuromorphic applications

IF 7.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY Applied Materials Today Pub Date : 2024-08-29 DOI:10.1016/j.apmt.2024.102405
Mohit Kumar, Jinchan Lee, Hyungtak Seo
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Abstract

The electric field-driven insulator-to-metal transition (IMT) offers a promising platform for developing controllable, futuristic neuromorphic nanoelectronics. However, the volatile nature of IMT, typically stimulated by a specific threshold voltage, limits its potential use primarily to switch-like applications. To broaden its applications, including in-material data processing, achieving on-demand IMT activation with dynamic memory capability is essential. This study demonstrates on-demand modulation of IMT behavior using spatially confined VO nanochannels, designed by local probe lithography. This approach enables the integration of ultrafast (∼180 ns) volatile switches (on/off ratio >10) and memory storage, from short- to long-term, in a single device. Notably, the threshold voltage was effectively reduced from 5.6 V to 2.8 V by precisely modulating the width of spatially embedded VO nanochannels. The observed memory behavior is attributed to persistent metallic domains and preferential IMT along these channels, as confirmed by optical and Kelvin probe force microscopy. Furthermore, the ability to classify input patterns, even in the presence of noise, was demonstrated using interconnected coplanar nanochannels by leveraging the short-term memory characteristics of the IMT. This report marks a significant step towards on-demand nanoscale manipulation of the IMT dynamics, laying the groundwork for ultrasmall, high-speed, and energy-efficient conventional and neuromorphic nanoelectronics.
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通过光刻纳米通道实现从绝缘体到金属的过渡,为神经形态应用提供可调的亚阈值电流发射
电场驱动的绝缘体到金属转变(IMT)为开发可控的未来神经形态纳米电子学提供了一个前景广阔的平台。然而,IMT 通常受特定阈值电压的刺激,其不稳定性限制了其主要用于开关类应用的潜力。为了扩大其应用范围,包括材料内数据处理,实现具有动态记忆能力的按需 IMT 激活至关重要。这项研究展示了利用局部探针光刻技术设计的空间约束 VO 纳米通道按需调制 IMT 行为。这种方法实现了在单个器件中集成超快(∼180 ns)易失开关(开/关比率大于 10)和内存存储(从短期到长期)。值得注意的是,通过精确调节空间嵌入式 VO 纳米通道的宽度,阈值电压从 5.6 V 有效降至 2.8 V。光学显微镜和开尔文探针力显微镜证实,观察到的记忆行为归因于沿这些通道的持久金属畴和优先 IMT。此外,通过利用 IMT 的短期记忆特性,利用相互连接的共面纳米通道,即使在存在噪声的情况下,也能对输入模式进行分类。该报告标志着在按需纳米级操纵 IMT 动态方面迈出了重要一步,为超小型、高速、高能效的传统和神经形态纳米电子学奠定了基础。
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来源期刊
Applied Materials Today
Applied Materials Today Materials Science-General Materials Science
CiteScore
14.90
自引率
3.60%
发文量
393
审稿时长
26 days
期刊介绍: Journal Name: Applied Materials Today Focus: Multi-disciplinary, rapid-publication journal Focused on cutting-edge applications of novel materials Overview: New materials discoveries have led to exciting fundamental breakthroughs. Materials research is now moving towards the translation of these scientific properties and principles.
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