Synthesis of double-helical snip nanowires for visible-light-driven photocatalytic degradation of dyes

IF 6.8 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY Science China Materials Pub Date : 2024-08-07 DOI:10.1007/s40843-024-2860-7
Mudussar Ali, Bowen Zhang  (, ), Qiang Li  (, ), Qingfeng Yan  (, )
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Abstract

As the first carbon-free double helical semiconductor at an atomic scale, tin phosphide iodide (SnIP) has garnered growing interest due to its high structural flexibility, band gap in the visible spectrum range, and non-toxicity. Herein, we report the chemical vapor transport synthesis of SnIP nanowires (NWs). The photocatalytic activity of SnIP NWs was evaluated through the degradation of two representative toxic dyes, methylene blue (MB) and malachite green (MG), under visible light irradiation (λ > 400 nm). These NWs exhibited notable photocatalytic efficiency, achieving degradation rates over 97% for MB and 95% for MG within 100 min of visible light exposure. The degradation data align well with a pseudo-first-order reaction kinetics model for both dyes, with rate constants of 0.0347 and 0.0295 min−1. Furthermore, the synthesized catalyst demonstrated exceptional stability and recyclability, maintaining its efficient performance till six duplicate operations cycles. Scavenger testing indicated that holes and OH radicals were the main active species driving the dye’s photodegradation. The unusual photocatalytic efficiency can be attributed to their favorable band gap within the visible spectrum range and unique one-dimensional structure. The results demonstrate that the SnIP NWs offer a promising choice for eco-friendly dye photodegradation.

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合成用于可见光驱动的染料光催化降解的双螺旋狙击纳米线
作为第一种原子尺度的无碳双螺旋半导体,碘化磷化锡(SnIP)因其结构灵活、在可见光谱范围内具有带隙和无毒性而受到越来越多的关注。在此,我们报告了 SnIP 纳米线(NWs)的化学气相传输合成。通过在可见光(λ > 400 nm)照射下降解两种具有代表性的有毒染料亚甲基蓝(MB)和孔雀石绿(MG),评估了 SnIP 纳米线的光催化活性。这些纳米线表现出显著的光催化效率,在可见光照射 100 分钟内,MB 和 MG 的降解率分别超过 97% 和 95%。降解数据与这两种染料的伪一阶反应动力学模型十分吻合,速率常数分别为 0.0347 和 0.0295 min-1。此外,合成的催化剂还表现出卓越的稳定性和可回收性,在重复操作六个周期后仍能保持高效性能。清除剂测试表明,空穴和 OH 自由基是驱动染料光降解的主要活性物质。不寻常的光催化效率可归因于其在可见光谱范围内的良好带隙和独特的一维结构。研究结果表明,SnIP NWs 为环保型染料光降解提供了一种很有前景的选择。
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来源期刊
Science China Materials
Science China Materials Materials Science-General Materials Science
CiteScore
11.40
自引率
7.40%
发文量
949
期刊介绍: Science China Materials (SCM) is a globally peer-reviewed journal that covers all facets of materials science. It is supervised by the Chinese Academy of Sciences and co-sponsored by the Chinese Academy of Sciences and the National Natural Science Foundation of China. The journal is jointly published monthly in both printed and electronic forms by Science China Press and Springer. The aim of SCM is to encourage communication of high-quality, innovative research results at the cutting-edge interface of materials science with chemistry, physics, biology, and engineering. It focuses on breakthroughs from around the world and aims to become a world-leading academic journal for materials science.
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