Photosensitizer-assisted direct 2D patterning and 3D printing of colloidal quantum dots

IF 9.5 2区 材料科学 Q1 CHEMISTRY, PHYSICAL Nano Research Pub Date : 2024-08-30 DOI:10.1007/s12274-024-6947-0
Wenyue Qing, Yilong Si, Mingfeng Cai, Likuan Zhou, Longjia Wu, Zhengwei Hou, Dan Liu, Xiaoli Tian, Wangyu Liu, Linhan Lin, Hao Zhang
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Abstract

Direct photopatterning is a powerful strategy for patterning colloidal quantum dots (QDs) for their integration in various electronic and optoelectronic devices. However, ultraviolet (UV) exposure required for QD patterning, especially those with short wavelength (e.g., deep UV light), can degrade the photo-, and electroluminescence, and other properties of patterned QDs. Here we develop a photosensitizer-assisted approach for direct photopatterning of QDs with h-line (centered at 405 nm) UV light and better preservation of their luminescent properties. This approach uses a photosensitizer that can absorb the h-line UV light and transfer the energy to activate bisazide-based crosslinkers via Dexter energy transfer. Uniform, high-resolution (smallest feature size, 2 µm), and full-color patterns of red, green, and blue QD layers can be achieved. The patterned QD layers maintain up to ∼ 90% of their original photoluminescent quantum yields, comparing favorably with those (< 60%) of QDs patterned without photosensitizers. We further extended the strategy to the direct three-dimensional (3D) printing of QDs. This photosensitizer-assisted approach offers a new way for direct two-dimensional (2D) photopatterning and 3D printing of colloidal QDs, with implications in building high-performance QD optoelectronic devices.

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光敏剂辅助胶体量子点的直接二维图案化和三维打印
直接光图案化是将胶体量子点(QDs)图案化以将其集成到各种电子和光电设备中的一种强大策略。然而,量子点图案化所需的紫外线(UV)照射,尤其是短波长的紫外线(如深紫外线),会降低图案化量子点的光致发光、电致发光和其他性能。在此,我们开发了一种光敏剂辅助方法,利用 h 线(以 405 纳米为中心)紫外线直接对 QDs 进行光图案化,从而更好地保持其发光特性。这种方法使用的光敏剂可以吸收 h 线紫外光,并通过 Dexter 能量转移将能量转移到激活双叠氮基交联剂上。可实现均匀、高分辨率(最小特征尺寸为 2 微米)和全彩的红、绿、蓝 QD 层图案。图案化的 QD 层可保持高达 90% 的原始光致发光量子产率,与未使用光敏剂图案化的 QD 层(60%)相比毫不逊色。我们进一步将这一策略扩展到直接三维(3D)打印 QDs。这种光敏剂辅助方法为胶体 QD 的直接二维(2D)光图案化和三维打印提供了一种新方法,对构建高性能 QD 光电器件具有重要意义。
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来源期刊
Nano Research
Nano Research 化学-材料科学:综合
CiteScore
14.30
自引率
11.10%
发文量
2574
审稿时长
1.7 months
期刊介绍: Nano Research is a peer-reviewed, international and interdisciplinary research journal that focuses on all aspects of nanoscience and nanotechnology. It solicits submissions in various topical areas, from basic aspects of nanoscale materials to practical applications. The journal publishes articles on synthesis, characterization, and manipulation of nanomaterials; nanoscale physics, electrical transport, and quantum physics; scanning probe microscopy and spectroscopy; nanofluidics; nanosensors; nanoelectronics and molecular electronics; nano-optics, nano-optoelectronics, and nano-photonics; nanomagnetics; nanobiotechnology and nanomedicine; and nanoscale modeling and simulations. Nano Research offers readers a combination of authoritative and comprehensive Reviews, original cutting-edge research in Communication and Full Paper formats. The journal also prioritizes rapid review to ensure prompt publication.
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