Temperature and Source Flux Dependence of Light Emission, In Incorporation and Quantum Confinement in Self-Formed Core–Shell InGaN Nanowires

IF 3.2 2区 化学 Q2 CHEMISTRY, MULTIDISCIPLINARY Crystal Growth & Design Pub Date : 2024-09-05 DOI:10.1021/acs.cgd.4c0092110.1021/acs.cgd.4c00921
Rongli Deng, Xuan Pu, Guanzhao Yang, Wenfeng Zhang, Haibin Lin, Junyong Li and Richard Nötzel*, 
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Abstract

We report our recent observations of the growth temperature and source flux dependence of the light emission, In incorporation and quantum confinement of core–shell InGaN nanowires (NWs), self-formed in the growth temperature regime of In desorption by plasma-assisted molecular beam epitaxy on Si(111). For elevated active N flux and for relatively low growth temperatures, the photoluminescence peak wavelength and the In incorporation as a function of growth temperature exhibit an unexpected maximum. With increasing In/Ga flux ratio, this maximum shifts to lower temperature. Together, the overall In content increases, the photoluminescence shifts to longer wavelengths, the In distribution becomes more uniform and the quantum confinement of electrons and holes in the In-rich nanowire core reduces. A model based on the interplay of thermally activated In desorption with thermally activated In surface diffusion on the nanowire sidewalls accounts for the experimental results for the realization of core–shell InGaN nanowires with emission wavelengths tuned to the visible red and green and the near-infrared telecom O-band.

Scheme of the growth process of core−shell InGaN Nanowires by the interplay of In surface desorption and diffusion on the m-plane NW sidewalls and c-plane NW top. In incorporation of the core−shell InGaN Nanowires first increases and further decreases with the increasing growth temperature but the temperature of maximum In incorporation shifts toward lower values for increasing In/Ga flux ratio.

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自形核壳 InGaN 纳米线的光发射、铟掺入和量子束缚的温度和源通量依赖性
我们报告了最近对核壳 InGaN 纳米线(NWs)的光发射、铟掺入和量子约束的生长温度和源通量依赖性的观察结果,核壳 InGaN 纳米线(NWs)是通过等离子体辅助分子束外延在 Si(111)上的铟解吸生长温度体系中自形成的。在活性氮通量较高和生长温度相对较低的情况下,光致发光峰值波长和铟掺入量与生长温度的函数关系呈现出意想不到的最大值。随着铟/镓通量比的增加,这个最大值会向更低的温度移动。综上所述,总体铟含量增加,光致发光转向更长的波长,铟的分布变得更加均匀,富含铟的纳米线内核中电子和空穴的量子约束减弱。基于纳米线侧壁上热激活 In 表面扩散与热激活 In 表面解吸相互作用的模型解释了实现核壳 InGaN 纳米线的实验结果,该纳米线的发射波长可调至可见光的红色和绿色波段以及近红外电信 O 波段。随着生长温度的升高,核壳 InGaN 纳米线的铟掺入量先是增加,然后进一步减少。
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来源期刊
Crystal Growth & Design
Crystal Growth & Design 化学-材料科学:综合
CiteScore
6.30
自引率
10.50%
发文量
650
审稿时长
1.9 months
期刊介绍: The aim of Crystal Growth & Design is to stimulate crossfertilization of knowledge among scientists and engineers working in the fields of crystal growth, crystal engineering, and the industrial application of crystalline materials. Crystal Growth & Design publishes theoretical and experimental studies of the physical, chemical, and biological phenomena and processes related to the design, growth, and application of crystalline materials. Synergistic approaches originating from different disciplines and technologies and integrating the fields of crystal growth, crystal engineering, intermolecular interactions, and industrial application are encouraged.
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