{"title":"Project of X-Ray Optical Scheme of a Lithograph with a Transmissive Dynamic Mask and a Synchrotron Radiation Source","authors":"I. V. Malyshev, N. I. Chkhalo, S. N. Yakunin","doi":"10.1134/S1063784224070272","DOIUrl":null,"url":null,"abstract":"<p>The paper proposes an X-ray optical scheme of a lithograph with a transmissive dynamic mask and a synchrotron radiation source. The image of a dynamic mask in the form of holes of small diameter is transferred with a decrease to a plate with a resist using a Schwarzschild projection lens. The formation of a topological pattern will occur due to the coordinated operation of the system for scanning a plate with a resist and a microelectromechanical system of a transmissive type. Objectives with a reduction of 10 and 20 times for obtaining 10–20 nm images of 200 nm holes of the dynamic mask are considered. The scheme of illumination of the mask is calculated, which provides uniform illumination on a field of 10 × 10 mm<sup>2</sup>. For the synchrotron Siberia-2 of the KISI on a bending magnet, the expected productivity of the lithograph will be up to 1/14 of a plate with a diameter of 100 mm per hour.</p>","PeriodicalId":783,"journal":{"name":"Technical Physics","volume":"69 7","pages":"2037 - 2044"},"PeriodicalIF":1.1000,"publicationDate":"2024-09-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Technical Physics","FirstCategoryId":"101","ListUrlMain":"https://link.springer.com/article/10.1134/S1063784224070272","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}
引用次数: 0
Abstract
The paper proposes an X-ray optical scheme of a lithograph with a transmissive dynamic mask and a synchrotron radiation source. The image of a dynamic mask in the form of holes of small diameter is transferred with a decrease to a plate with a resist using a Schwarzschild projection lens. The formation of a topological pattern will occur due to the coordinated operation of the system for scanning a plate with a resist and a microelectromechanical system of a transmissive type. Objectives with a reduction of 10 and 20 times for obtaining 10–20 nm images of 200 nm holes of the dynamic mask are considered. The scheme of illumination of the mask is calculated, which provides uniform illumination on a field of 10 × 10 mm2. For the synchrotron Siberia-2 of the KISI on a bending magnet, the expected productivity of the lithograph will be up to 1/14 of a plate with a diameter of 100 mm per hour.
期刊介绍:
Technical Physics is a journal that contains practical information on all aspects of applied physics, especially instrumentation and measurement techniques. Particular emphasis is put on plasma physics and related fields such as studies of charged particles in electromagnetic fields, synchrotron radiation, electron and ion beams, gas lasers and discharges. Other journal topics are the properties of condensed matter, including semiconductors, superconductors, gases, liquids, and different materials.