{"title":"Subdiffraction-Limited Motheye-Like Metastructures Fabrication by Dual-Beam Overexposure Methodology Enhancing Broadband Infrared Antireflective Application (Advanced Optical Materials 29/2024)","authors":"Peng Ran, Qingsong Wang, Jiong Wang, Wenbo Chen, Zeyu Zhao, Xiaoliang Ma, Xiong Li, Mingbo Pu, Xiangang Luo","doi":"10.1002/adom.202470090","DOIUrl":null,"url":null,"abstract":"<p><b>Motheye-Like Metastructures with Broadband Infrared Antireflectivity</b></p><p>Materials possessing broadband antireflective properties benefit applications of military camouflage, photovoltaic devices, and highly transparent windows. In this work (see article number 2401341 by Zeyu Zhao, Xiangang Luo, and co-workers), large-area subdiffraction-limited motheye-like metastructures with broadband infrared antireflectivity are realized by dual-beam overexposure shrinking strategy and controllable anisotropic reactive ion etching process. A reflectivity across the overall spectrum of 3–12 µm lower than 2.0% is demonstrated.\n\n <figure>\n <div><picture>\n <source></source></picture><p></p>\n </div>\n </figure></p>","PeriodicalId":116,"journal":{"name":"Advanced Optical Materials","volume":null,"pages":null},"PeriodicalIF":8.0000,"publicationDate":"2024-10-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/adom.202470090","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Optical Materials","FirstCategoryId":"88","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/adom.202470090","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
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Abstract
Motheye-Like Metastructures with Broadband Infrared Antireflectivity
Materials possessing broadband antireflective properties benefit applications of military camouflage, photovoltaic devices, and highly transparent windows. In this work (see article number 2401341 by Zeyu Zhao, Xiangang Luo, and co-workers), large-area subdiffraction-limited motheye-like metastructures with broadband infrared antireflectivity are realized by dual-beam overexposure shrinking strategy and controllable anisotropic reactive ion etching process. A reflectivity across the overall spectrum of 3–12 µm lower than 2.0% is demonstrated.
期刊介绍：
Advanced Optical Materials, part of the esteemed Advanced portfolio, is a unique materials science journal concentrating on all facets of light-matter interactions. For over a decade, it has been the preferred optical materials journal for significant discoveries in photonics, plasmonics, metamaterials, and more. The Advanced portfolio from Wiley is a collection of globally respected, high-impact journals that disseminate the best science from established and emerging researchers, aiding them in fulfilling their mission and amplifying the reach of their scientific discoveries.
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