Subdiffraction-Limited Motheye-Like Metastructures Fabrication by Dual-Beam Overexposure Methodology Enhancing Broadband Infrared Antireflective Application (Advanced Optical Materials 29/2024)

Abstract

Motheye-Like Metastructures with Broadband Infrared Antireflectivity

Materials possessing broadband antireflective properties benefit applications of military camouflage, photovoltaic devices, and highly transparent windows. In this work (see article number 2401341 by Zeyu Zhao, Xiangang Luo, and co-workers), large-area subdiffraction-limited motheye-like metastructures with broadband infrared antireflectivity are realized by dual-beam overexposure shrinking strategy and controllable anisotropic reactive ion etching process. A reflectivity across the overall spectrum of 3–12 µm lower than 2.0% is demonstrated.