Intense violet electroluminescence of thin SiO2 layers with SnO2 nanocrystals

Q3 Physics and Astronomy Results in Optics Pub Date : 2024-10-11 DOI:10.1016/j.rio.2024.100750
Ivan Romanov , Irina Parkhomenko , Liudmila Vlasukova , Elke Wendler , Fadei Komarov
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Abstract

It has been shown that Sn implantation with subsequent annealing in air leads to an increase in the electroluminescence (EL) intensity of SiO2/Si structure by two orders of magnitude. Intense violet EL with a maximum at 3.21  eV was observed at room temperature by the naked eye at forward bias. The observed emission was attributed to radiative recombination in SnO2 nanocrystals synthesized in SiO2 layers. The external quantum efficiency (EQE) increased with decreasing Sn concentration The maximum external quantum efficiency was found to be 0.7 % for the silica film Sn-implanted at the lowest fluence of 2.5 × 1016 cm−2. The non-radiative charge transport (shunt current) through the sample and mechanism of EL excitation are discussed. It has been concluded that the Poole–Frenkel mechanism, or tunneling between traps are the most likely mechanisms of charge transport to light-emitting centers.

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含有二氧化锡纳米晶体的二氧化硅薄层发出强烈的紫色电致发光
研究表明,在空气中植入锡并随后进行退火处理可使二氧化硅/硅结构的电致发光(EL)强度提高两个数量级。在室温和正向偏压条件下,肉眼可观察到最大值为 3.21 eV 的紫光电致发光。观察到的发射归因于在二氧化硅层中合成的二氧化锡纳米晶体的辐射重组。外部量子效率(EQE)随着锡浓度的降低而增加。在 2.5 × 1016 cm-2 的最低通量下,二氧化硅薄膜的锡植入的最大外部量子效率为 0.7%。讨论了通过样品的非辐射电荷传输(分流电流)和电致发光激发机制。得出的结论是,Poole-Frenkel 机制或陷阱之间的隧道效应是电荷传输到发光中心的最可能机制。
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来源期刊
Results in Optics
Results in Optics Physics and Astronomy-Atomic and Molecular Physics, and Optics
CiteScore
2.50
自引率
0.00%
发文量
115
审稿时长
71 days
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