Electrical and structural investigation of Pt/n-type GaN Schottky contacts: The possible origin of inhomogeneous barrier

IF 3.9 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Materials Science and Engineering B-advanced Functional Solid-state Materials Pub Date : 2024-10-17 DOI:10.1016/j.mseb.2024.117756
Mohammed Mamor , Marie Pierre Chauvat , Pierre Ruterana
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Abstract

An ideal metal/GaN interface is not usually possible and the surface states are often present at such interface and therefore affect the Schottky barrier diode (SBD) performance. In this work the interface states in Pt/n-type GaN SBD were extracted using temperature dependent forward current–voltage (I-V-T) characteristics over a large temperature range (80–400 K). The energy profile distribution of the density of interface states NSS (E) and its dependence on the temperature were determined from the bias and temperature dependence of the measured effective barrier height Ф0bn(V,T) and ideality factor n (V, T). It is shown that the interface states density at room temperature decreases with increasing energy with respect to the conduction band. It is shown that the effective Schottky barrier height (SBH) and ideality factor are correlated to the density of interface states. This result suggests that interface states density contributes to barrier inhomogeneities in Pt/n-type GaN SBD. Fourier transform deep level transient spectroscopy (FT-DLTS) has been employed to extract qualitative information about the native defects present in as-grown n-type GaN. From FT-DLTS, two prominent native defects D2 and D3 were observed in GaN. The defect D2 located at EC- 0.56 eV could be associated with impurity at Ga site. The defect D3 located at EC- 0.26 eV has been assigned to nitrogen-related energy level. These native defects are interpreted as responsible of the existence of interface states and then to the barrier inhomogeneities at Pt/n-type GaN contacts. Furthermore, other possible origins of the interface states at Pt/n-type GaN interface are discussed in terms of the threading dislocations inside the GaN templates that reach the surface and other possible irregularities at this interface.
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Pt/n 型 GaN 肖特基触点的电学和结构研究:不均匀势垒的可能起源
理想的金属/氮化镓界面通常是不可能的,表面态通常会出现在这种界面上,从而影响肖特基势垒二极管(SBD)的性能。在这项研究中,利用温度相关的正向电流-电压(I-V-T)特性,在较大的温度范围(80-400 K)内提取了铂/氮化镓型 SBD 的界面态。界面态密度 NSS (E) 的能谱分布及其对温度的依赖性是根据测量到的有效势垒高度 Ф0bn(V,T) 和理想度系数 n (V, T) 的偏置和温度依赖性确定的。结果表明,室温下的界面态密度随着导带能量的增加而减小。结果表明,有效肖特基势垒高度(SBH)和理想度系数与界面态密度相关。这一结果表明,界面态密度导致了 Pt/n 型氮化镓 SBD 的势垒不均匀性。傅立叶变换深电平瞬态光谱法(FT-DLTS)被用来提取有关生长中的 n 型氮化镓中存在的原生缺陷的定性信息。从 FT-DLTS 中观察到氮化镓中存在两个突出的原生缺陷 D2 和 D3。位于 EC- 0.56 eV 的缺陷 D2 可能与 Ga 位点的杂质有关。位于 EC- 0.26 eV 的缺陷 D3 被归入与氮有关的能级。这些原生缺陷被解释为界面态存在的原因,进而导致铂/氮型氮化镓接触的势垒不均匀性。此外,还讨论了铂/氮型氮化镓界面态的其他可能来源,包括氮化镓模板内部到达表面的穿线位错以及该界面上其他可能的不规则性。
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来源期刊
CiteScore
5.60
自引率
2.80%
发文量
481
审稿时长
3.5 months
期刊介绍: The journal provides an international medium for the publication of theoretical and experimental studies and reviews related to the electronic, electrochemical, ionic, magnetic, optical, and biosensing properties of solid state materials in bulk, thin film and particulate forms. Papers dealing with synthesis, processing, characterization, structure, physical properties and computational aspects of nano-crystalline, crystalline, amorphous and glassy forms of ceramics, semiconductors, layered insertion compounds, low-dimensional compounds and systems, fast-ion conductors, polymers and dielectrics are viewed as suitable for publication. Articles focused on nano-structured aspects of these advanced solid-state materials will also be considered suitable.
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