Effect of temperature and magnetic field on the density of surface states in semiconductor heterostructures

U.I. Erkaboev, N.Yu. Sharibaev, M.G. Dadamirzaev, R.G. Rakhimov
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Abstract

In this article, the physical properties of the surface of the CdS/Si(p) material under the influence of a magnetic field were studied . The dependence of the density of surface states of the p-type Si(p) semiconductor on the magnetic field and temperature has been studied. For the first time, a mathematical model has been developed to determine the temperature dependence of the density of surface states of a semiconductor under the influence of a strong magnetic field. Mathematical modeling of processes was carried out using experimental values of the continuous energy spectrum of the density of surface states, obtained at various low temperatures and strong magnetic fields, in the band gap of silicon. The possibility of calculating discrete energy levels is demonstrated.
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温度和磁场对半导体异质结构表面态密度的影响
本文研究了磁场影响下 CdS/Si(p)材料表面的物理特性。研究了 p 型 Si(p)半导体表面态密度对磁场和温度的依赖性。首次建立了一个数学模型来确定强磁场影响下半导体表面态密度的温度依赖性。利用在不同低温和强磁场条件下获得的硅带隙表面态密度连续能谱的实验值,对这一过程进行了数学建模。证明了计算离散能级的可能性。
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