Computationally Driven Discovery of T Center-like Quantum Defects in Silicon

IF 14.4 1区 化学 Q1 CHEMISTRY, MULTIDISCIPLINARY Journal of the American Chemical Society Pub Date : 2024-10-28 DOI:10.1021/jacs.4c0661310.1021/jacs.4c06613
Yihuang Xiong, Jiongzhi Zheng, Shay McBride, Xueyue Zhang, Sinéad M. Griffin and Geoffroy Hautier*, 
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Abstract

Quantum technologies would benefit from the development of high-performance quantum defects acting as single-photon emitters or spin-photon interfaces. Finding such a quantum defect in silicon is especially appealing in view of its favorable spin bath and high processability. While some color centers in silicon have been emerging in quantum applications, there remains a need to search for and develop new high-performance quantum emitters. By searching a high-throughput computational database of more than 22,000 charged complex defects in silicon, we identify a series of defects formed by a group III element combined with carbon ((A–C)Si with A = B, Al, Ga, In, Tl) and substituting on a silicon site. These defects are analogous structurally, electronically, and chemically to the well-known T center in silicon ((C–C–H)Si), and their optical properties are mainly driven by an unpaired electron on the carbon p orbital. They all emit in the telecom, and some of these color centers show improved properties compared to the T center in terms of computed radiative lifetime, emission efficiency, or smaller optical linewidth. The kinetic barrier computations and previous experimental evidence show that these T center-like defects can be formed through the capture of a diffusing carbon by a substitutional group III atom. We also show that the synthesis of hydrogenated T center-like defects followed by a dehydrogenation annealing step could facilitate the formation of these defects. Our work motivates further studies on the synthesis and control of this new family of quantum defects and demonstrates the use of high-throughput computational screening to discover new color center candidates.

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通过计算发现硅中的 T 中心类量子缺陷
量子技术将受益于作为单光子发射器或自旋光子界面的高性能量子缺陷的发展。鉴于硅具有良好的自旋浴和高加工性,在硅中寻找这样的量子缺陷尤其具有吸引力。虽然硅中的一些色彩中心已在量子应用中崭露头角,但仍有必要寻找和开发新的高性能量子发射器。通过搜索硅中超过 22,000 个带电复合缺陷的高通量计算数据库,我们发现了一系列由第三族元素与碳((A-C)Si,A = B、Al、Ga、In、Tl)结合并取代硅位点而形成的缺陷。这些缺陷在结构上、电子学上和化学上类似于硅中著名的 T 中心((C-C-H)Si),它们的光学特性主要由碳 p 轨道上的非配对电子驱动。它们都在电信中发射,其中一些颜色中心在计算辐射寿命、发射效率或更小的光学线宽方面显示出比 T 中心更好的特性。动力学势垒计算和先前的实验证据表明,这些类似 T 中心的缺陷可以通过置换的 III 族原子捕获扩散的碳而形成。我们还表明,氢化 T 中心样缺陷的合成和脱氢退火步骤可以促进这些缺陷的形成。我们的工作激发了对这一新量子缺陷家族的合成和控制的进一步研究,并展示了如何利用高通量计算筛选来发现新的色心候选物。
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来源期刊
CiteScore
24.40
自引率
6.00%
发文量
2398
审稿时长
1.6 months
期刊介绍: The flagship journal of the American Chemical Society, known as the Journal of the American Chemical Society (JACS), has been a prestigious publication since its establishment in 1879. It holds a preeminent position in the field of chemistry and related interdisciplinary sciences. JACS is committed to disseminating cutting-edge research papers, covering a wide range of topics, and encompasses approximately 19,000 pages of Articles, Communications, and Perspectives annually. With a weekly publication frequency, JACS plays a vital role in advancing the field of chemistry by providing essential research.
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