Irradiance-tailoring integral-illumination polarization homogenizer based on anamorphic aspheric microlens arrays.

IF 3.2 2区 物理与天体物理 Q2 OPTICS Optics express Pub Date : 2024-07-15 DOI:10.1364/OE.525845
Yue Liu, Jingping Zhu, Chen Chen, Xun Hou, Yongtian Wang
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Abstract

In the realm of active polarization detection systems, the imperative for polarization illumination systems with high-uniformity and predefined-shape irradiance distribution is evident. This paper introduces a novel anamorphic aspheric (AAS) microlens array (MLA) integral polarization homogenizer, incorporating projection MLA (PMLA), condenser MLA (CMLA), polarization film (PF), and a sub-image array (SIA) mask based on Kohler illumination principles. Firstly, the optimal design of an AAS-based projection sub-lens is proposed to facilitate the creation of a short-working-distance, predefined-geometric and sharp polarization irradiance tailoring. The SIA mask is constituted by plenty of predistortion SIs, which are generated through a combination of chief ray tracing and the radial basis function (RBF) image warping method. In addition, accompanied with tolerance sensitivity analysis, detailed analysis of stray light generation factors and proposed elimination or suppression methods further ensure the engineering reliability and stability of the proposed system. A compact integral-illumination polarization homogenizer design example is realized with an overall irradiance uniformity exceeding 90% and a volume of 25 mm × 25 mm × 18.25 mm. Different predefined-geometrical-profile and high-uniformity polarization irradiance distribution can be achieved by substituting different SIA masks and PFs, without replacing MLA optical elements, which greatly saves cost. Substantial simulations and experiments corroborate the efficacy of our polarization homogenizer.

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基于非球面微透镜阵列的辐照度定制整体照明偏振均匀器。
在主动偏振探测系统领域,具有高均匀性和预定形状辐照度分布的偏振照明系统的必要性显而易见。本文介绍了一种新型非球面(AAS)微透镜阵列(MLA)整体偏振均质器,它集成了投影 MLA(PMLA)、聚光 MLA(CMLA)、偏振膜(PF)和基于科勒照明原理的子图像阵列(SIA)掩膜。首先,提出了基于 AAS 的投影子透镜的优化设计方案,以促进创建短工作距离、预定几何形状和锐利偏振辐照度的裁剪。SIA 掩膜由大量预失真 SI 构成,这些 SI 是通过主光线跟踪和径向基函数 (RBF) 图像扭曲方法组合生成的。此外,伴随着容差灵敏度分析,对杂散光产生因素的详细分析以及提出的消除或抑制方法,进一步确保了所提系统的工程可靠性和稳定性。实现了一个紧凑的整体照明偏振匀化器设计实例,其整体辐照度均匀性超过 90%,体积为 25 mm × 25 mm × 18.25 mm。通过替换不同的 SIA 掩膜和 PF,可以实现不同的预定义几何轮廓和高均匀度偏振辐照度分布,而无需更换 MLA 光学元件,从而大大节约了成本。大量的模拟和实验证实了我们的偏振匀化器的功效。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Optics express
Optics express 物理-光学
CiteScore
6.60
自引率
15.80%
发文量
5182
审稿时长
2.1 months
期刊介绍: Optics Express is the all-electronic, open access journal for optics providing rapid publication for peer-reviewed articles that emphasize scientific and technology innovations in all aspects of optics and photonics.
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