Electronic structure of CsPbBr3 with isovalent doping and divacancies: the smallest metal Pb cluster†

IF 9.5 2区 材料科学 Q1 CHEMISTRY, PHYSICAL Journal of Materials Chemistry A Pub Date : 2024-11-29 DOI:10.1039/D4TA05802J
Xiangyue Cui, Bowen Wang, Dandan Zhang, Hongfei Chen, Hejin Yan, Zheng Shu and Yongqing Cai
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Abstract

Cesium lead bromide (CsPbBr3) has attracted considerable attention as a promising candidate for photovoltaic and optoelectronic applications owing to its relatively high defect tolerance. So far, most studies have focused on single vacancy defects while the effect of higher-order divacancy has been overlooked. Here we uncover the mechanism of formation of the Br divacancy (DVBr), a popular type of defect that usually develops with time. We predict that DVBr is formed via merging two isolated Br single vacancies (VBr) and is stabilized in an apical configuration. Owing to the low formation energy of VBr, resulting in a high population of vacancy, we predict that DVBr could be common in CsPbBr3, especially for those samples that are highly radiated or exposed to electric field or Br-poor environment. A single VBr tends to be stabilized as −1 charged defect (VBr1−), forming a Pb–Pb dimer, especially in p-doped CsPbBr3, and possesses an in-gap defective level at 0.53 eV below the bottom of the conduction band. This Pb–Pb dimer would be the smallest metal Pb cluster in CsPbBr3, and likely in other Pb-based perovskites, and is harmful for light emission because of its deep localized defective level. Fortunately, the number of VBr1− could be dropped through VBr1− = VBr0 + e and converted into a begin VBr0 being free of in-gap defect level and an unbound Pb–Pb structure. Each DVBr is stabilized by a redox charge transfer process via 2VBr0 → VBr1+ + VBr1−, and also possesses a deep defect level, similar to VBr1−. We also demonstrate the ease of forming Cl and I substituent dopants in CsPbBr3. Our work can inspire further studies on vacancy clusters in other metal halide perovskites.

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具有等价掺杂和距离的CsPbBr3的电子结构:最小金属Pb簇
铯-溴化铅(CsPbBr3)由于其相对耐受缺陷的特性,在光伏和光电子领域具有广阔的应用前景。目前的研究大多集中在单个空位缺陷上,忽略了高阶空位缺陷的影响。本文揭示了一种常见的随时间发展而形成的缺陷——溴缺位的形成机制。我们预测DVBr是由两个孤立的Br单空位(VBr)合并形成的,并稳定在顶端构型。由于VBr的形成能较低,因此空位占比高,我们预测在CsPbBr3中可能普遍存在DVBr,特别是对于那些高辐射或暴露于电场或低br环境的样品。我们发现单个VBr倾向于带-1电荷(V1- Br),特别是对于p掺杂的CsPbBr3,表现为具有特征Pb-Pb调光结构的VBr极化子态。这种Pb-Pb二聚体是CsPbBr3中最小的金属Pb团簇,由于与V0 Br相关的局部缺陷水平,对发光有害。相比之下,DVBr不产生陷阱能级,是良性的,可能是由于其源VBr的负u行为,表明后者的带隙中有两个电子填充(+/1)跃迁能级。幸运的是,通过将每两个VBr生成一个DVBr,或者通过V1- Br = V0 Br + e-还原V1- Br,使其转化为具有未结合Pb-Pb结构的V0 Br,可以减少不需要的V1- Br的数量。DVBr和V0 Br均无陷阱能级,高阶无陷阱的DVBr可能是CsPbBr3耐受性缺陷的根本原因之一。我们还证明了在CsPbBr3中易于形成Cl和I取代掺杂剂。本研究对其他金属卤化物钙钛矿中空位团簇的研究具有一定的启发作用。
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来源期刊
Journal of Materials Chemistry A
Journal of Materials Chemistry A CHEMISTRY, PHYSICAL-ENERGY & FUELS
CiteScore
19.50
自引率
5.00%
发文量
1892
审稿时长
1.5 months
期刊介绍: The Journal of Materials Chemistry A, B & C covers a wide range of high-quality studies in the field of materials chemistry, with each section focusing on specific applications of the materials studied. Journal of Materials Chemistry A emphasizes applications in energy and sustainability, including topics such as artificial photosynthesis, batteries, and fuel cells. Journal of Materials Chemistry B focuses on applications in biology and medicine, while Journal of Materials Chemistry C covers applications in optical, magnetic, and electronic devices. Example topic areas within the scope of Journal of Materials Chemistry A include catalysis, green/sustainable materials, sensors, and water treatment, among others.
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