Topical Sunscreens: A Narrative Review for Contact Sensitivity, Potential Allergens, Clinical Evaluation, and Management for their Optimal Use in Clinical Practice.

IF 1.9 Q3 DERMATOLOGY Indian Dermatology Online Journal Pub Date : 2024-10-28 eCollection Date: 2024-11-01 DOI:10.4103/idoj.idoj_111_24
Vikram K Mahajan, Neeraj Sharma, Vikas Sharma, Rohit Verma, Monika Chandel, Ravinder Singh
{"title":"Topical Sunscreens: A Narrative Review for Contact Sensitivity, Potential Allergens, Clinical Evaluation, and Management for their Optimal Use in Clinical Practice.","authors":"Vikram K Mahajan, Neeraj Sharma, Vikas Sharma, Rohit Verma, Monika Chandel, Ravinder Singh","doi":"10.4103/idoj.idoj_111_24","DOIUrl":null,"url":null,"abstract":"<p><p>Topical sunscreens decrease the quantity of ultraviolet (UV) light from the sun reaching the skin by either blocking or scattering it and help protect the skin from dyspigmentation, photoaging, DNA damage, and photocarcinogenesis, especially in photosensitive individuals. The significant role played by visible light and infrared light in skin pigmentation and photoaging has been recognized in recent years. The majority of broad-spectrum sunscreens protect against UV-B (290-320nm) and UV-A (320-400nm) radiation. Allergic reactions to sunscreens were relatively uncommon compared to their widespread use in the last more than four decades. With growing awareness of problems associated with excessive sunlight exposure, their use has increased exponentially, especially that of cosmetics and other personal grooming products containing UV filters. In recent years, sunscreen agents have been commonly identified as causing allergic contact dermatitis and photodermatitis. Thus, allergic contact dermatitis, photo-irritation, photo-allergenicity, and photo-toxicity (acute/subacute effects) are of immediate concern in the assessment of topical sunscreens for their optimal use. Sunscreen chemicals such as p-aminobenzoic acid (PABA) and PABA esters, the cinnamates, benzophenones, oxybenzone, and dibenzoylmethane that absorb UV radiation are common contact sensitizers capable of producing both allergic contact dermatitis and photodermatitis. The excipients in sunscreen formulations by themselves may also cause allergic reactions. Herein, we review potential allergens, clinical evaluation, and management aspects of topical sunscreen contact sensitivity for their optimal use in clinical practice.</p>","PeriodicalId":13335,"journal":{"name":"Indian Dermatology Online Journal","volume":"15 6","pages":"920-929"},"PeriodicalIF":1.9000,"publicationDate":"2024-10-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC11616936/pdf/","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Indian Dermatology Online Journal","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.4103/idoj.idoj_111_24","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2024/11/1 0:00:00","PubModel":"eCollection","JCR":"Q3","JCRName":"DERMATOLOGY","Score":null,"Total":0}
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Abstract

Topical sunscreens decrease the quantity of ultraviolet (UV) light from the sun reaching the skin by either blocking or scattering it and help protect the skin from dyspigmentation, photoaging, DNA damage, and photocarcinogenesis, especially in photosensitive individuals. The significant role played by visible light and infrared light in skin pigmentation and photoaging has been recognized in recent years. The majority of broad-spectrum sunscreens protect against UV-B (290-320nm) and UV-A (320-400nm) radiation. Allergic reactions to sunscreens were relatively uncommon compared to their widespread use in the last more than four decades. With growing awareness of problems associated with excessive sunlight exposure, their use has increased exponentially, especially that of cosmetics and other personal grooming products containing UV filters. In recent years, sunscreen agents have been commonly identified as causing allergic contact dermatitis and photodermatitis. Thus, allergic contact dermatitis, photo-irritation, photo-allergenicity, and photo-toxicity (acute/subacute effects) are of immediate concern in the assessment of topical sunscreens for their optimal use. Sunscreen chemicals such as p-aminobenzoic acid (PABA) and PABA esters, the cinnamates, benzophenones, oxybenzone, and dibenzoylmethane that absorb UV radiation are common contact sensitizers capable of producing both allergic contact dermatitis and photodermatitis. The excipients in sunscreen formulations by themselves may also cause allergic reactions. Herein, we review potential allergens, clinical evaluation, and management aspects of topical sunscreen contact sensitivity for their optimal use in clinical practice.

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局部防晒霜:接触敏感性、潜在过敏原、临床评估和临床实践最佳使用管理的叙述性回顾。
局部防晒霜通过阻挡或散射太阳紫外线来减少到达皮肤的紫外线量,并有助于保护皮肤免受色素沉着、光老化、DNA损伤和光致癌作用,特别是对光敏个体。近年来,人们已经认识到可见光和红外光在皮肤色素沉着和光老化中的重要作用。大多数广谱防晒霜都能防止紫外线b(290-320纳米)和紫外线a(320-400纳米)的辐射。与过去40多年来防晒霜的广泛使用相比,对防晒霜的过敏反应相对罕见。随着人们越来越意识到与过度阳光照射有关的问题,它们的使用呈指数级增长,特别是化妆品和其他含有紫外线过滤器的个人护理产品。近年来,人们普遍认为防晒霜会引起过敏性接触性皮炎和光性皮炎。因此,过敏性接触性皮炎、光刺激、光致敏性和光毒性(急性/亚急性效应)是评估局部防晒霜最佳使用时需要立即关注的问题。防晒化学物质,如对氨基苯甲酸(PABA)和PABA酯,肉桂酸酯,二苯甲酮,氧苯酮和二苯甲酰甲烷,吸收紫外线辐射是常见的接触致敏剂,能够产生过敏性接触性皮炎和光性皮炎。防晒配方中的辅料本身也可能引起过敏反应。在此,我们回顾潜在的过敏原,临床评估和管理方面的局部防晒霜接触敏感性的最佳使用在临床实践中。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
2.00
自引率
11.80%
发文量
201
审稿时长
49 weeks
期刊最新文献
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