Hao Liu, Jifei Ye, Wei Rao, Haichao Cui, Sibo Wang
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引用次数: 0
Abstract
The combined pulse laser (CPL) based on long-pulsed lasers has been proven to be an effective way of improving laser processing efficiency by combining their processing advantages. In this Letter, a CPL with a 500 mJ millisecond pulse and a 150 mJ nanosecond pulse is utilized to study the interaction process between laser and silicon. Based on high-speed images of plasma distribution and laser supported detonation wave (LSDW), as well as the height characteristics of ablation morphology, the energy coupling of plasma with variable delay time is analyzed. The irradiation of the material by millisecond pulse within the delay time enhances the strong coupling process between nanosecond pulse and the target.
期刊介绍：
The Optical Society (OSA) publishes high-quality, peer-reviewed articles in its portfolio of journals, which serve the full breadth of the optics and photonics community.
Optics Letters offers rapid dissemination of new results in all areas of optics with short, original, peer-reviewed communications. Optics Letters covers the latest research in optical science, including optical measurements, optical components and devices, atmospheric optics, biomedical optics, Fourier optics, integrated optics, optical processing, optoelectronics, lasers, nonlinear optics, optical storage and holography, optical coherence, polarization, quantum electronics, ultrafast optical phenomena, photonic crystals, and fiber optics. Criteria used in determining acceptability of contributions include newsworthiness to a substantial part of the optics community and the effect of rapid publication on the research of others. This journal, published twice each month, is where readers look for the latest discoveries in optics.
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