Investigation On Barrier Layers Of PT/BaTiO3/PT Based Thin Film Capacitors

IF 2.6 4区 材料科学 Q2 CHEMISTRY, MULTIDISCIPLINARY ChemNanoMat Pub Date : 2024-10-22 DOI:10.1002/cnma.202400316
P. S. Smitha, V. Suresh Babu, M. K. Asmin
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Abstract

Barium titanate is a ferroelectric material used as a dielectric in thin film capacitors owing to its high dielectric constant. Barrier layers are utilized in these capacitors to improve the capacitors’ performance by controlling the microstructure and creating thin resistive films. In this paper, the effect of barrier layers in Pt/BT/Pt capacitors is studied using zinc oxide and aluminium oxide. The performance parameters such as capacitance density, leakage current, equivalent series resistance, dielectric loss and dielectric strength of Pt/BT/Pt thin film capacitors with barrier layers of different sizes are simulated using COMSOL Multiphysics modeling software. 2 nm thick aluminum oxide as Pt - BT barrier layer gives optimal performance. The leakage current, dielectric loss, capacitance density, equivalent series resistance and dielectric strength of Pt/BT/Pt capacitor are found to be 0.519 mA, 9.62×10−12, 172.8 fF/μm2, 9.62 kΩ, 108 V/m respectively whereas that of Pt/ALO/BT/ALO/Pt capacitor are found to be 1.56×10−18 A, 7.81×10−18, 11.6 fF/μm2, 9.01×1015 Ω, 5.05×109 V/m respectively. The low capacitance in Pt/ALO/BT/ALO/Pt capacitor is due to the low dielectric constant of aluminium dioxide barrier layer. The reduced leakage current and increased equivalent series resistance is due to the low conductivity of the aluminium oxide barrier layer. The use of aluminium oxide barrier layer between the conductive surfaces can reduce the electric field and increase the breakdown voltage, leading to improved dielectric strength and reduced dielectric loss.

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基于 PT/BaTiO3/PT 的薄膜电容器阻隔层研究
钛酸钡是一种铁电材料,因其介电常数高而被用作薄膜电容器的电介质。在这些电容器中使用阻挡层是为了通过控制微观结构和形成电阻薄膜来提高电容器的性能。本文使用氧化锌和氧化铝研究了阻挡层对 Pt/BT/Pt 电容器的影响。使用 COMSOL Multiphysics 建模软件模拟了带有不同尺寸阻挡层的 Pt/BT/Pt 薄膜电容器的电容密度、漏电流、等效串联电阻、介质损耗和介电强度等性能参数。2 nm 厚的氧化铝作为铂-BT 阻挡层,具有最佳性能。结果发现,Pt/BT/Pt 电容器的漏电流、介质损耗、电容密度、等效串联电阻和介电强度分别为 0.519 mA、9.62×10-12、172.8 fF/μm2、9.62 kΩ、108 V/m,而 Pt/ALO/BT/ALO/Pt 电容器的漏电流、介质损耗、电容密度、等效串联电阻和介电强度分别为 1.56×10-18 A、7.81×10-18、11.6 fF/μm2、9.01×1015 Ω、5.05×109 V/m。Pt/ALO/BT/ALO/Pt 电容器的低电容是由于二氧化铝阻挡层的低介电常数造成的。漏电流降低和等效串联电阻增加是由于氧化铝阻挡层的低导电率。在导电表面之间使用氧化铝阻挡层可以降低电场,提高击穿电压,从而提高介电强度,降低介电损耗。
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来源期刊
ChemNanoMat
ChemNanoMat Energy-Energy Engineering and Power Technology
CiteScore
6.10
自引率
2.60%
发文量
236
期刊介绍: ChemNanoMat is a new journal published in close cooperation with the teams of Angewandte Chemie and Advanced Materials, and is the new sister journal to Chemistry—An Asian Journal.
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