A 76.9 ppm/K Nano-Watt PVT-Insensitive CMOS Voltage Reference Operating From 4 to 300 K for Integrated Cryogenic Quantum Interface

IF 5.6 1区 工程技术 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC IEEE Journal of Solid-state Circuits Pub Date : 2025-01-28 DOI:10.1109/JSSC.2025.3530472
Jing Wang;Jun He;Man-Kay Law;Xinzhe Wang;Futian Liang;Lin Cheng
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Abstract

This work proposes a temperature and process-compensated low-power Cryo-CMOS voltage reference without trimming for quantum integrated interface, which is capable of operating continuously from room temperature (RT) down to cryogenic temperatures. By compensating for the main accuracy limiting factors including the process dependence of the transistor threshold voltage, device mismatch and device nonlinearity deterioration, the proposed fully CMOS voltage reference achieves simultaneous process and temperature compensation over an ultra-wide operating range from 300 to 4 K. Fabricated in a standard 180 nm process, measurement results from 80 test chips across two batches can successfully demonstrate an average temperature coefficient (TC) of 76.9 ppm/K after a one-time model correction. The proposed circuit consumes only 195–304 nW over the entire operating range and maintains a voltage fluctuation of just 0.72% with an average ${V} _{\mathrm {REF}}$ of 1.045 V. The minimum supply voltages are 1.5 V at 300 K and 1.9 V at 4 K, respectively. The proposed process voltage temperature (PVT)-insensitive highly accurate voltage reference in standard CMOS with nanowatt power consumption can be integrated cost-effectively into quantum interface circuits.
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一个76.9 ppm/K的纳米瓦特pvt不敏感CMOS电压基准,工作在4到300 K的集成低温量子界面
本工作提出了一种温度和工艺补偿的低功耗Cryo-CMOS电压基准,无需修整量子集成接口,能够从室温(RT)到低温连续工作。通过补偿主要的精度限制因素,包括晶体管阈值电压的工艺依赖性,器件失配和器件非线性退化,所提出的全CMOS电压基准在300至4 K的超宽工作范围内实现了同时的工艺和温度补偿。在标准的180纳米工艺中制造,两批80个测试芯片的测量结果可以成功地证明,经过一次模型校正后,平均温度系数(TC)为76.9 ppm/K。该电路在整个工作范围内的功耗仅为195-304 nW,电压波动仅为0.72%,平均${V} _{\数学{REF}}$为1.045 V。300k时的最小电源电压为1.5 V, 4k时的最小电源电压为1.9 V。所提出的工艺电压温度(PVT)不敏感的高精度电压基准可以低成本地集成到量子接口电路中,功耗为纳瓦级。
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来源期刊
IEEE Journal of Solid-state Circuits
IEEE Journal of Solid-state Circuits 工程技术-工程:电子与电气
CiteScore
11.00
自引率
20.40%
发文量
351
审稿时长
3-6 weeks
期刊介绍: The IEEE Journal of Solid-State Circuits publishes papers each month in the broad area of solid-state circuits with particular emphasis on transistor-level design of integrated circuits. It also provides coverage of topics such as circuits modeling, technology, systems design, layout, and testing that relate directly to IC design. Integrated circuits and VLSI are of principal interest; material related to discrete circuit design is seldom published. Experimental verification is strongly encouraged.
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