Study on doping modification of 4H-SiC and its effect on molecular adsorption of SiC2

IF 2.4 4区 物理与天体物理 Q3 PHYSICS, CONDENSED MATTER Solid State Communications Pub Date : 2024-12-20 DOI:10.1016/j.ssc.2024.115811
Hongyu Ma , Ning Gu
{"title":"Study on doping modification of 4H-SiC and its effect on molecular adsorption of SiC2","authors":"Hongyu Ma ,&nbsp;Ning Gu","doi":"10.1016/j.ssc.2024.115811","DOIUrl":null,"url":null,"abstract":"<div><div>SiC<sub>2</sub> molecules are one of the primary gas-phase components during the Physical vapor transport (PVT) growth of 4H-SiC single crystals [1]. At present, SiC crystals are mainly divided into three types: intrinsic, N-doped and Al-doped. This paper constructs intrinsic, N-doped, and Al-doped systems of 4H-SiC, using the (000–1) plane as the adsorption surface. Through Density functional theory (DFT) methods, the adsorption energy was calculated, revealing that the adsorption is chemical in nature, with the aluminum-doped system being the most stable. The bonding information obtained, including the covalency and bond lengths, indicates that SiC<sub>2</sub> molecules primarily form C-C covalent bonds with the silicon carbide surface, playing a major role in adsorption stability. Additionally, charge transfer between SiC<sub>2</sub> molecules and the silicon carbide system indicates the presence of electrostatic interactions, which play a secondary role in adsorption stability.</div></div>","PeriodicalId":430,"journal":{"name":"Solid State Communications","volume":"397 ","pages":"Article 115811"},"PeriodicalIF":2.4000,"publicationDate":"2024-12-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Solid State Communications","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0038109824003880","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"PHYSICS, CONDENSED MATTER","Score":null,"Total":0}
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Abstract

SiC2 molecules are one of the primary gas-phase components during the Physical vapor transport (PVT) growth of 4H-SiC single crystals [1]. At present, SiC crystals are mainly divided into three types: intrinsic, N-doped and Al-doped. This paper constructs intrinsic, N-doped, and Al-doped systems of 4H-SiC, using the (000–1) plane as the adsorption surface. Through Density functional theory (DFT) methods, the adsorption energy was calculated, revealing that the adsorption is chemical in nature, with the aluminum-doped system being the most stable. The bonding information obtained, including the covalency and bond lengths, indicates that SiC2 molecules primarily form C-C covalent bonds with the silicon carbide surface, playing a major role in adsorption stability. Additionally, charge transfer between SiC2 molecules and the silicon carbide system indicates the presence of electrostatic interactions, which play a secondary role in adsorption stability.
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掺杂改性4H-SiC及其对SiC2分子吸附影响的研究
SiC2分子是4H-SiC单晶[1]物理气相输运(PVT)生长过程中的主要气相组分之一。目前,SiC晶体主要分为本征型、n掺杂型和al掺杂型三种。本文以(000-1)平面为吸附面,构建了4H-SiC的本征、掺n和掺al体系。通过密度泛函理论(DFT)方法计算了吸附能,揭示了吸附本质上是化学吸附,掺铝体系是最稳定的。得到的键合信息,包括共价和键长,表明SiC2分子主要与碳化硅表面形成C-C共价键,对吸附稳定性起主要作用。此外,SiC2分子与碳化硅体系之间的电荷转移表明存在静电相互作用,静电相互作用在吸附稳定性中起次要作用。
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来源期刊
Solid State Communications
Solid State Communications 物理-物理:凝聚态物理
CiteScore
3.40
自引率
4.80%
发文量
287
审稿时长
51 days
期刊介绍: Solid State Communications is an international medium for the publication of short communications and original research articles on significant developments in condensed matter science, giving scientists immediate access to important, recently completed work. The journal publishes original experimental and theoretical research on the physical and chemical properties of solids and other condensed systems and also on their preparation. The submission of manuscripts reporting research on the basic physics of materials science and devices, as well as of state-of-the-art microstructures and nanostructures, is encouraged. A coherent quantitative treatment emphasizing new physics is expected rather than a simple accumulation of experimental data. Consistent with these aims, the short communications should be kept concise and short, usually not longer than six printed pages. The number of figures and tables should also be kept to a minimum. Solid State Communications now also welcomes original research articles without length restrictions. The Fast-Track section of Solid State Communications is the venue for very rapid publication of short communications on significant developments in condensed matter science. The goal is to offer the broad condensed matter community quick and immediate access to publish recently completed papers in research areas that are rapidly evolving and in which there are developments with great potential impact.
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