Point2skh: End-to-end Parametric Primitive Inference from Point Clouds with Improved Denoising Transformer

IF 3 3区 计算机科学 Q2 COMPUTER SCIENCE, SOFTWARE ENGINEERING Computer-Aided Design Pub Date : 2024-12-31 DOI:10.1016/j.cad.2024.103838
Cheng Wang , Wenyu Sun , Xinzhu Ma , Fei Deng
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Abstract

Recovering the CAD command sequence from the point cloud is an essential component in CAD reverse engineering. In this paper, we strive to solve this problem from both the perspectives of artificial intelligence and the procedures of procedural CAD models. We propose a CAD reconstruction method based on an end-to-end point-to-sketch network (Point2Skh) that can produce the CAD modeling sequence from the input geometrical point cloud by recovering the inverse sketch-and-extrude process. The point cloud is first segmented into point sets corresponding to the same extrusion. The modeling sequence can then be recovered by combining the network prediction of each point set. The proposed Point2Skh can detect and infer command vectors of sketch curves (line, arc, and circle) and the extrusion operation from the input point cloud of a single extrusion. By directly representing the sketch with its curves and inferring the command parameters, accurate sketch reconstruction is produced, which further leads to precise CAD reconstruction with sharp edges. The produced CAD modeling sequence is human-interpretable and can be readily edited by importing it into CAD tools. Experiments show that the Chamfer Distance (CD) between the predicted results and the ground truth is 0.312, and the primitive type and parameter accuracy are 93.87% and 83.24%, respectively.

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来源期刊
Computer-Aided Design
Computer-Aided Design 工程技术-计算机:软件工程
CiteScore
5.50
自引率
4.70%
发文量
117
审稿时长
4.2 months
期刊介绍: Computer-Aided Design is a leading international journal that provides academia and industry with key papers on research and developments in the application of computers to design. Computer-Aided Design invites papers reporting new research, as well as novel or particularly significant applications, within a wide range of topics, spanning all stages of design process from concept creation to manufacture and beyond.
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